Hermetic MEMS device and method for fabricating hermetic MEMS device and package structure of MEMS device
First Claim
1. A hermetic microelectromechanical system (MEMS) package, comprising:
- a CMOS MEMS chip, having a silicon substrate and a structural dielectric layer, wherein the silicon substrate have a first surface and a second surface opposite to the first surface and has a MEMS region and a CMOS integrated-circuit (IC) region, wherein CMOS transistors are formed on the first surface of the silicon substrate in the CMOS IC region and the silicon substrate is used as a transistor substrate of the CMOS transistors, wherein the silicon substrate is structural to form a chamber at the MEMS region and a MEMS structure within the chamber, wherein the structural dielectric layer comprises an interconnection structure formed on the first surface of the silicon substrate over the CMOS IC region and the MEMS region, wherein the interconnection structure is used to connect the CMOS transistors to form a CMOS IC and electrically couple between the CMOS IC and the MEMS structure within the chamber, wherein the interconnection structure further comprises a protection structure layer formed in the structural dielectric layer and the chamber is covered by the protection structure layer,wherein the chamber is exposed to an environment at the second surface of the silicon substrate, the interconnection structure further comprises an output pad structure to couple an electrical signal of the CMOS MEMS chip out; and
a first substrate, adhered to the second surface of the first substrate on the chamber via an adhesive layer to form a hermetic space, wherein the MEMS structure is within the hermetic space.
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Abstract
A hermetic microelectromechanical system (MEMS) package includes a CMOS MEMS chip and a second substrate. The CMOS MEMS Chip has a first substrate, a structural dielectric layer, a CMOS circuit and a MEMS structure. The structural dielectric layer is disposed on a first side of the first structural substrate. The structural dielectric layer has an interconnect structure for electrical interconnection and also has a protection structure layer. The first structural substrate has at least a hole. The hole is under the protection structure layer to form at least a chamber. The chamber is exposed to the environment in the second side of the first structural substrate. The chamber also comprises a MEMS structure. The second substrate is adhered to a second side of the first substrate over the chamber to form a hermetic space and the MEMS structure is within the space.
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Citations
24 Claims
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1. A hermetic microelectromechanical system (MEMS) package, comprising:
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a CMOS MEMS chip, having a silicon substrate and a structural dielectric layer, wherein the silicon substrate have a first surface and a second surface opposite to the first surface and has a MEMS region and a CMOS integrated-circuit (IC) region, wherein CMOS transistors are formed on the first surface of the silicon substrate in the CMOS IC region and the silicon substrate is used as a transistor substrate of the CMOS transistors, wherein the silicon substrate is structural to form a chamber at the MEMS region and a MEMS structure within the chamber, wherein the structural dielectric layer comprises an interconnection structure formed on the first surface of the silicon substrate over the CMOS IC region and the MEMS region, wherein the interconnection structure is used to connect the CMOS transistors to form a CMOS IC and electrically couple between the CMOS IC and the MEMS structure within the chamber, wherein the interconnection structure further comprises a protection structure layer formed in the structural dielectric layer and the chamber is covered by the protection structure layer, wherein the chamber is exposed to an environment at the second surface of the silicon substrate, the interconnection structure further comprises an output pad structure to couple an electrical signal of the CMOS MEMS chip out; and a first substrate, adhered to the second surface of the first substrate on the chamber via an adhesive layer to form a hermetic space, wherein the MEMS structure is within the hermetic space. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A package structure of microelectromechanical system (MEMS) device, comprising:
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a CMOS MEMS die, comprising; a CMOS MEMS chip, having a silicon substrate and a structural dielectric layer, wherein the silicon substrate have a first surface and a second surface opposite to the first surface and has a MEMS region and a CMOS integrated-circuit (IC) region, wherein CMOS transistors are formed on the first surface of the silicon substrate in the CMOS IC region and the silicon substrate is used as a transistor substrate of the CMOS transistors, wherein the silicon substrate is structural to form a chamber at the MEMS region and a MEMS structure within the chamber, wherein the structural dielectric layer comprises an interconnection structure formed on the first surface of the silicon substrate over the CMOS IC region and the MEMS region, wherein the interconnection structure is used to connect the CMOS transistors to form a CMOS IC and electrically couple between the CMOS IC and the MEMS structure within the chamber, wherein the interconnection structure further comprises a protection structure layer formed in the structural dielectric layer and the chamber is covered by the protection structure layer, wherein the chamber is exposed to an environment at the second surface of the silicon substrate, the interconnection structure further comprises an output pad structure to couple an electrical signal of the CMOS MEMS chip out; and a first substrate, adhered to the second surface of the silicon substrate via an adhesive layer over the chamber to form a hermetic space, wherein the MEMS structure is within the hermetic space; a packaging circuit substrate, for holding the MEMS die; and a molding layer, encapsulating over the MEMS die and the packaging circuit substrate. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification