Immersion lithographic apparatus with a projection system having an isolated or movable part

• US 8,218,125 B2
• Filed: 12/19/2008
• Issued: 07/10/2012
• Est. Priority Date: 07/28/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Mulkens, Johannes Catharinus Hubertus
• Primary Examiner(s): Kim, Peter B
• Assistant Examiner(s): Liu, Chia-how Michael
• Application Number:
  US12/340,237
• Publication Number:
  US 20090201476A1
• Time in Patent Office: 1,299 Days
• Field of Search: 355/52, 355/55, 355/67, 355/53
• US Class Current: 355/52
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.

Claims

1. A lithographic apparatus comprising:

a projection system including;

a first part having a first optical element, the first part arranged to contact liquid in use, and

a second part having a second optical element;

a substrate table configured to hold a substrate and move the substrate relative to the first optical element of the first part;

a liquid supply system configured to provide the liquid in a region between the projection system and the substrate table; and

a sensor configured to measure a positional relationship between the first part and the second part and/or between the first optical element of the first part and the second optical element of the second part.

2. The lithographic apparatus of claim 1, further comprising:

a first member configured to support the first part; and

a second different member configured to support the second part.

3. The lithographic apparatus of claim 2, further comprising a frame supporting the first part and the second part.

4. The lithographic apparatus of claim 1, wherein an image of a pattern formed on the substrate is controlled by adjusting the positioning between the first part and the second part.

5. The lithographic apparatus of claim 1, further comprising an actuator configured to change the relative position between the first part and the second part.

6. The lithographic apparatus of claim 5, wherein the actuator is configured to change the relative position between the first part and the second part based on the measured positional relationship.

7. The lithographic apparatus of claim 6, wherein the first part includes the actuator.

8. The lithographic apparatus of claim 6, wherein the actuator is coupled between the second part and a frame supporting the first part and the second part.

9. The lithographic apparatus of claim 6, wherein the actuator is configured to adjust in at least two degrees of freedom the relative position between the first part and the second part.

10. A lithographic apparatus comprising:

a projection system including;

a first part having a first optical element, the first part arranged to contact liquid in use, and

a second part having a second optical element;

a substrate table configured to hold a substrate and move the substrate relative to the first optical element of the first part;

a liquid supply system configured to provide the liquid in a region between the projection system and the substrate table; and

a sensor configured to measure a positional relationship between the first part and the second part,

wherein the second part is isolated from the first part such that substantially no vibrations are transmitted between the first part and the second part.