Interspinous process implants and methods of use

• US 8,221,463 B2
• Filed: 05/31/2007
• Issued: 07/17/2012
• Est. Priority Date: 10/29/2002
• Status: Active Grant

• Current Assignee: Medtronic Europe SARL (Medtronic Plc)
• Original Assignee: Kyphon SARL (Medtronic Plc)
• Inventors: Zucherman, James F., Hsu, Ken Y., Klyce, Henry A., Winslow, Charles J., Yerby, Scott A., Flynn, John J., Mitchell, Steven T., Markwart, John A.
• Primary Examiner(s): Snow, Bruce E
• Assistant Examiner(s): HOBAN, MELISSA A
• Application Number:
  US11/806,526
• Publication Number:
  US 20080027545A1
• Time in Patent Office: 1,874 Days
• Field of Search: 606/248
• US Class Current: 606/249
• CPC Class Codes: A61B 17/7047 Clamps comprising opposed elements which grasp one vertebra between them
• CPC Class Codes: A61B 17/7053 with parts attached to bones or to each other by flexible wires, straps, sutures or cables
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 17/7068 Devices comprising separate rigid parts, assembled in situ, to bear on each side of spinous processes; Tools therefor
• CPC Class Codes: A61B 17/842 Flexible wires, bands or straps A61B17/72, A61B17/82, A61B17/86 take precedence

Abstract

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

Claims

1. A method, comprising:

inserting a first implant member into a location of a body including a space between adjacent spinous processes from a first side of the adjacent spinous processes, the first implant member comprising first and second wings and a first spacer disposed between the first and second wings, the first and second wings each having a greater height than the first spacer, wherein the height is measured in the direction from an inferior surface of one of the adjacent spinous processes toward a superior surface of the other of the adjacent spinous processes;

inserting a second implant member into the body from the first side after the first implant member, the second implant member comprising third and fourth wings and a second spacer disposed between the third and fourth wings, the third and fourth wings each having a greater height than the second spacer, wherein the height is measured in the direction from the inferior surface of one of the adjacent spinous processes toward the superior surface of the other of the adjacent spinous processes; and

sliding the second implant member along the first implant member until a central portion of the second implant member is substantially aligned with a central portion of the first implant member.

2. The method of claim 1, further comprising:

limiting extension of a spine including the adjacent spinous processes after the sliding;

limiting lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a first direction after the sliding; and

limiting lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a second direction opposite the first direction after the sliding.

3. The method of claim 1, further comprising:

fitting a locking portion of an interface surface of the first implant member with a locking portion of an interface surface of the second implant member.

4. The method of claim 1, further comprising:

mating a slot portion of an interface surface of the first implant member with a rail portion of an interface surface of the second implant member.

5. A method, comprising:

inserting a first implant member into a location of a body including a space between adjacent spinous processes along a path in a direction, the first implant member having a distal end portion larger than a proximal end portion along a dimension; and

inserting a second implant member along the path after inserting the first implant member; and

moving the second implant member in the direction along the first implant member until substantially aligned with the first implant member, the second implant member having a distal end portion smaller than a proximal end portion along the dimension.

6. The method of claim 5, further comprising:

sliding the second implant member along the first implant member until substantially aligned with the first implant member.

7. The method of claim 5, wherein:

the first implant member is elongate having a length between a distal end of the distal end portion of the first implant member and a proximal end of the proximal end portion of the first implant member;

the second implant member is elongate having a length between a distal end of the distal end portion of the second implant member and a proximal end of the proximal end portion of the second implant member; and

the length of the first implant member is greater than the length of the second implant member.

8. The method of claim 5, wherein:

the distal end portion of the first implant member and the distal end portion of second implant member collectively having a size along a dimension substantially corresponding to a size of the proximal end portion of the first implant member and the proximal end portion of the second implant member collectively along the dimension.

9. The method of claim 5, wherein:

the distal end portion of the first implant member and the distal end portion of second implant member collectively having a size along a dimension greater than a size of a central portion of the first implant member and a central portion of the second implant member collectively; and

the proximal end portion of the first implant member and the proximal end portion of the second implant member collectively having a size along the dimension greater than the size of the central portion of the first implant member and the central portion of the second implant member collectively.

10. The method of claim 5, wherein:

a central portion of the first implant member and a central portion of the second implant collectively configured to limit extension of a spine including the adjacent spinous processes;

the distal end portion of the first implant member and the distal end portion of the second implant member collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a first direction; and

the proximal end portion of the first implant member and the proximal end portion of the second implant member collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a second direction opposite the first direction.

11. The method of claim 5, further comprising:

fitting a locking portion of an interface surface of the first implant member fit with a locking portion of an interface surface of the second implant member.

12. The method of claim 5, further comprising:

mating a slot portion of an interface surface of the first implant member with a rail portion of an interface surface of the second implant member.

13. The method of claim 5, further comprising:

distracting the adjacent spinous processes during the inserting of the first implant member; and

limiting movement of the first implant member and the second implant member collectively along the first direction and along a second direction opposite the first direction.

14. The method of claim 5, further comprising:

distracting the adjacent spinous processes during the inserting of the first implant member;

distracting the adjacent spinous processes during the inserting of the second implant member; and

limiting movement of the first implant member and the second implant member collectively along the first direction and along a second direction opposite the first direction.

15. A method, comprising:

inserting a first implant member into a location of a body including a space between adjacent spinous processes from a first side of the adjacent spinous processes, the first implant member comprising first and second wings and a first spacer disposed between the first and second wings, the first and second wings each having a greater height than the first spacer, wherein the height is measured in the direction from an inferior surface of one of the adjacent spinous processes toward a superior surface of the other of the adjacent spinous processes;

movingly mating, from the first side, an interface surface of a second implant member with an interface surface of the first implant member to collectively form an interspinous process implant, the second implant member comprising third and fourth wings and a second spacer disposed between the third and fourth wings, the third and fourth wings each having a greater height than the second spacer, wherein the height is measured in the direction from the inferior surface of one of the adjacent spinous processes toward the superior surface of the other of the adjacent spinous processes; and

prior to mating the interface surface of the second implant member with the interface surface of the first implant member, distracting the adjacent spinous processes via the first implant member.

16. The method of claim 15, wherein the mating includes further distracting the adjacent spinous processes.

17. The method of claim 15, wherein the interspinous process implant has a midline offset from a boundary defined by the interface surface of the first implant member and the interface surface of the second implant member.

18. The method of claim 15, further comprising:

complimentarily fitting a locking portion of the interface surface of the first implant member with a locking portion of the interface surface of the second implant member.

19. The method of claim 15, further comprising:

mating a slot portion of the interface surface of the first implant member with a rail portion of the interface surface of the second implant member.

20. The method of claim 15, further comprising:

limiting movement of the first implant member and the second implant member collectively relative to the adjacent spinous processes in a first direction.

21. The method of claim 15, further comprising:

slidably moving the first implant member relative to the second implant member until a central portion of the first implant member is substantially aligned with a central portion of the second implant member.

22. The method of claim 15, wherein:

a central portion of the first implant member and a central portion of the second implant member are collectively configured to limit extension of a spine including the adjacent spinous processes when the central portion of the second implant member is substantially aligned with the central portion of the first implant member;

a distal end portion of the first implant member and a distal end portion of the second implant member are collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a first direction when the central portion of the second implant member is substantially aligned with the central portion of the first implant member; and

a proximal end portion of the first implant member and a proximal end portion of the second implant member are collectively configured to limit lateral motion of the first implant member and the second implant member relative to the adjacent spinous processes in a second direction opposite the first direction when the central portion of the second implant member is substantially aligned with the central portion of the first implant member.

23. A method for inserting a spinal implant comprising:

inserting a first implant member into an interspinous space between adjacent spinous processes from a first lateral side of the adjacent spinous processes;

while the first implant member is disposed in the interspinous space, inserting a second implant member into the interspinous space from the first lateral side of the adjacent spinous processes;

wherein the inserting the second implant comprises coupling the second implant member to the first implant member while the first implant member is disposed in the interspinous space;

wherein, when coupled together, at least one of the first and second implant members cradles one of the adjacent spinous processes.

24. The method of claim 23 wherein the inserting the second implant member distracts the adjacent spinous processes with the first and second implant members.

25. The method of claim 24 wherein the inserting the first implant member comprises distracting the adjacent spinous processes with the first implant member.