Eliminate release etch attack by interface modification in sacrificial layers
First Claim
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1. A method of making a microelectromechanical system (MEMS) device, comprising:
- forming a sacrificial layer over a substrate;
treating at least a portion of the sacrificial layer to form a treated sacrificial portion, wherein a substantial portion of the sacrificial layer remains after the treating and, wherein the treated sacrificial portion comprises an upper treated sacrificial layer, and a remaining portion of the sacrificial layer comprises a lower substantially untreated sacrificial layer;
forming an overlying layer over at least a part of the treated sacrificial portion; and
at least partially removing the treated sacrificial portion to form a cavity situated between the substrate and the overlying layer, the overlying layer being exposed to the cavity.
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Abstract
Methods of making a microelectromechanical system (MEMS) device are described. In some embodiments, the method includes forming a sacrificial layer over a substrate, treating at least a portion of the sacrificial layer to form a treated sacrificial portion, forming an overlying layer over at least a part of the treated sacrificial portion, and at least partially removing the treated sacrificial portion to form a cavity situated between the substrate and the overlying layer, the overlying layer being exposed to the cavity.
79 Citations
32 Claims
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1. A method of making a microelectromechanical system (MEMS) device, comprising:
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forming a sacrificial layer over a substrate; treating at least a portion of the sacrificial layer to form a treated sacrificial portion, wherein a substantial portion of the sacrificial layer remains after the treating and, wherein the treated sacrificial portion comprises an upper treated sacrificial layer, and a remaining portion of the sacrificial layer comprises a lower substantially untreated sacrificial layer; forming an overlying layer over at least a part of the treated sacrificial portion; and at least partially removing the treated sacrificial portion to form a cavity situated between the substrate and the overlying layer, the overlying layer being exposed to the cavity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32)
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Specification