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Substrate support with electrostatic chuck having dual temperature zones

  • US 8,226,769 B2
  • Filed: 04/26/2007
  • Issued: 07/24/2012
  • Est. Priority Date: 04/27/2006
  • Status: Active Grant
First Claim
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1. An electrostatic chuck for receiving a substrate in a process chamber, the chuck comprising:

  • (a) a ceramic puck comprising a substrate receiving surface and an opposing backside surface, the backside surface comprising a plurality of spaced apart mesas;

    (b) a plurality of heat transfer gas conduits traversing the ceramic puck and terminating in ports on the substrate receiving surface to provide heat transfer gas to the substrate receiving surface;

    (c) an electrode embedded in the ceramic puck to generate an electrostatic force to retain a substrate placed on the substrate receiving surface; and

    (d) first and second heater coils that are radially spaced apart, concentric about one another, and embedded in the ceramic puck, the first heater coil located at a peripheral portion of the ceramic puck and the second heater coil located at a central portion of the ceramic puck.

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