Exposure apparatus, exposure method, and device manufacturing method
First Claim
1. An exposure apparatus apparatus comprising:
- a movable body which holds an object and substantially moves along a predetermined plane;
a liquid supply device which supplies liquid on a surface of the movable body on which the object is mounted including a surface of the object;
a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of the movable body, the pattern generation device irradiating an energy beam on the object via the optical system and the liquid and forming a pattern on the object;
a measurement system which includes an encoder system that has a plurality of encoder heads placed on the surface of the movable body and that measures positional information of the movable body, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and
a detection device which is connected to the measurement system, and for at least one of the plurality of encoder heads, detects residual information of the liquid on a photodetection section of the encoder head and outputs the detection results to the measurement system, whereinthe encoder system measures positional information of the movable body within the predetermined plane based on an output of the predetermined number of the encoder heads except for an encoder head which was detected to have liquid remaining by the detection device.
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Accused Products
Abstract
In an exposure apparatus of a liquid immersion exposure method, there is a case when a wafer table holding a wafer moves, a liquid immersion area formed by liquid supplied in a space between a wafer table and a projection optical system passes over a head mounted on the wafer table. Therefore, for a head over which the liquid immersion area has passed, the residual presence of the liquid is detected based on an amount of light of a reflected light received by the light receiving element which receives the reflected light from the wafer table surface. And, of a plurality of heads, positional information of the wafer table is measured, based on measurement values of a head that had no liquid remaining in the detection.
65 Citations
22 Claims
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1. An exposure apparatus apparatus comprising:
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a movable body which holds an object and substantially moves along a predetermined plane; a liquid supply device which supplies liquid on a surface of the movable body on which the object is mounted including a surface of the object; a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of the movable body, the pattern generation device irradiating an energy beam on the object via the optical system and the liquid and forming a pattern on the object; a measurement system which includes an encoder system that has a plurality of encoder heads placed on the surface of the movable body and that measures positional information of the movable body, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and a detection device which is connected to the measurement system, and for at least one of the plurality of encoder heads, detects residual information of the liquid on a photodetection section of the encoder head and outputs the detection results to the measurement system, wherein the encoder system measures positional information of the movable body within the predetermined plane based on an output of the predetermined number of the encoder heads except for an encoder head which was detected to have liquid remaining by the detection device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An exposure apparatus comprising:
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a movable body which holds an object and substantially moves along a predetermined plane; a liquid supply device which supplies liquid on a surface of the movable body on which the object is mounted including a surface of the object; a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of the movable body, the pattern generation device irradiating an energy beam on the object via the optical system and the liquid and forming a pattern on the object; a measurement system which includes an encoder system that has a plurality of encoder heads placed on the surface of the movable body and that measures positional information of the movable body, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and a detection device which is connected to the measurement system, and for at least one of the plurality of encoder heads, detects residual information of the liquid on a photodetection section of the encoder head and outputs the detection results to the measurement system, wherein the detection device detects the residual information of the liquid for an encoder head which has passed through a liquid immersion area formed by the liquid, based on the positional information of the movable body within the predetermined plane measured by the measurement system.
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15. An exposure apparatus comprising:
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a movable body which holds an object and substantially moves along a predetermined plane; a liquid supply device which supplies liquid on a surface of the movable body on which the object is mounted including a surface of the object; a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of the movable body, the pattern generation device irradiating an energy beam on the object via the optical system and the liquid and forming apattern on the object; a measurement system which includes an encoder system that has a plurality of encoder heads placed on the surface of the movable body and that measures positional information of the movable body, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and a detection device which is connected to the measurement system, and for at least one of the plurality of encoder heads, detects residual information of the liquid on a photodetection section of the encoder head and outputs the detection results to the measurement system, wherein the detection device is provided in each of the plurality of encoder heads. - View Dependent Claims (16)
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17. An exposure apparatus comprising:
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a movable body which holds an object and substantially moves along a predetermined plane; a liquid supply device which supplies liquid on a surface of the movable body on which the object is mounted including a surface of the object; a pattern generation device including an optical system which has liquid supplied to a space formed with the surface of the movable body, the pattern generation device irradiating an energy beam on the object via the optical system and the liquid and forming a pattern on the object; a measurement system which includes an encoder system that has a plurality of encoder heads placed on the surface of the movable body and that measures positional information of the movable body, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and a detection device which is connected to the measurement system, and for at least one of the plurality of encoder heads, detects residual information of the liquid on a photodetection section of the encoder head and outputs the detection results to the measurement system, wherein the surface of the movable body is covered with a light transmission member which forms a substantially flush surface with the object with a small gap in between, and covers the plurality of encoder heads.
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18. An exposure method in which an energy beam is irradiated on an object via an optical system and liquid, and a pattern is formed on the object, the method comprising:
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a measurement process in which, of a plurality of encoder heads placed on a surface of a movable body where the object is mounted and that substantially moves along a predetermined plane, positional information of the movable body is measured, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and a detection process in which residual information of the liquid on a photodetection section of the encoder head is detected for at least one of the plurality of encoder heads, wherein in the measurement process, the positional information of the movable body within the predetermined plane is measured, based on an output of the predetermined number of the encoder heads except for an encoder head which was detected to have liquid remaining in the detection process. - View Dependent Claims (19, 20, 21)
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22. An exposure method comprising:
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a measurement process in which, of aplurality of encoder heads placed on a surface of a movable body where an object is mounted and that substantially moves along a predetermined plane positional information of the movable body is measured, based on an output of a predetermined number of the encoder heads facing a grating section placed parallel to the predetermined plane external to the movable body; and a detection process in which residual information of the liquid on a photodetection section of the encoder head is detected for at least one of the plurality of encoder heads, wherein in the detection process, residual information of the liquid is detected for an encoder head which has passed through a liquid immersion area formed by the liquid, based on positional information of the movable body within the predetermined plane.
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Specification