Coupling apparatus, exposure apparatus, and device fabricating method
First Claim
Patent Images
1. A lithographic projection apparatus comprising:
- an illumination system arranged to condition a radiation beam;
a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern;
a substrate table configured to hold a substrate;
a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a first part and a second part arranged between the first part and the substrate table, the first and second parts are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part, wherein each part comprises an optical element of the projection system and the first and second parts are not attached to and movable with the substrate;
an actuator configured to vary a position between the first and second parts; and
a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid,wherein the substrate table is movable with respect to the projection system while at least part of the space between the projection system and the substrate is filled with the liquid.
0 Assignments
0 Petitions
Accused Products
Abstract
An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate via the projection optical system and the liquid, wherein the projection optical system has a first group comprising an optical member that contacts the liquid, and a second group that differs from that first group; the first group is supported by a first support member; and the second group is separated from the first group and is supported by the second support member that differs from the first support member.
137 Citations
27 Claims
-
1. A lithographic projection apparatus comprising:
-
an illumination system arranged to condition a radiation beam; a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a first part and a second part arranged between the first part and the substrate table, the first and second parts are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part, wherein each part comprises an optical element of the projection system and the first and second parts are not attached to and movable with the substrate; an actuator configured to vary a position between the first and second parts; and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, wherein the substrate table is movable with respect to the projection system while at least part of the space between the projection system and the substrate is filled with the liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 22, 23)
-
-
8. A device manufacturing method, comprising:
-
providing a liquid to a space between a substrate on a substrate table of a lithographic apparatus and a projection system of the lithographic apparatus, the projection system including a first part and a second part arranged between the first part and the substrate table, the second part being substantially isolated from the first part such that vibrations in the second part are substantially prevented from being transferred to the first part and the first and second parts are not attached to and movable with the substrate; adjusting a relative positioning of the first and second parts of the projection System; and projecting a patterned beam of radiation, using the first and second parts of the projection system, through the liquid onto a target portion of a substrate, wherein the substrate table is movable with respect to the projection system while at least part of the space between the projection system and the substrate is filled with the liquid. - View Dependent Claims (9, 10, 11, 12, 13, 14, 24, 25)
-
-
15. A lithographic projection apparatus comprising:
-
an illumination system arranged to condition a radiation beam; a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern; a substrate table that holds a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, the projection system comprising a first part and a second part arranged between the first part and the substrate table, the first and second parts are two separate physical parts that are decoupled, wherein each of the first and second parts comprises an optical element of the projection system; an actuator configured to vary a position between the first and second parts; and a liquid supply system that at least partly fills a space between the projection system and the substrate with a liquid, wherein the substrate table is movable with respect to the projection system while at least part of the space between the projection system and the substrate is filled with the liquid. - View Dependent Claims (16, 17, 18, 19, 20, 21, 26, 27)
-
Specification