Substrate alignment

• US 8,231,821 B2
• Filed: 11/02/2009
• Issued: 07/31/2012
• Est. Priority Date: 11/04/2008
• Status: Active Grant

• Current Assignee: Molecular Imprints, Inc. (Canon Inc.)
• Original Assignee: Molecular Imprints, Inc. (Canon Inc.)
• Inventors: Choi, Byung-Jin, Nimmakayala, Pawan Kumar, GanapathiSubramanian, Mahadevan
• Primary Examiner(s): Del Sole, Joseph
• Assistant Examiner(s): Sultana, Nahida
• Application Number:
  US12/610,714
• Publication Number:
  US 20100109202A1
• Time in Patent Office: 1,002 Days
• Field of Search: 264/293, 264/40.1, 264/40.5, 264/1.33, 264/1.7, 264/409, 425/385, 425/150, 425/174.4, 425/810
• US Class Current: 264/409
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 9/7011 Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
• CPC Class Codes: G03F 9/7053 Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
• CPC Class Codes: G03F 9/7084 Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
• CPC Class Codes: Y10S 425/81 Sound record

Abstract

Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.

Claims

1. A method of patterning a substrate having an inner edge and inner diameter that is positionable about a shaft having an outer diameter and an axis of rotation, the method comprising:

providing a template with a patterning surface having concentrically arrayed features, the template in superimposition with the substrate;

determining the location of a first point on the inner edge of the substrate relative to the template;

determining a radius difference based on the difference between the diameter of the shaft and the inner diameter of the substrate;

biasing the substrate such that the first point of the substrate is translated relative to the template by the radius difference; and

imprinting a patterned layer on the substrate with the template, wherein features of the patterned layer are imprinted such that they are concentric to the axis of rotation of the shaft when the outer diameter of the shaft is contacted with the first point of the substrate.

2. The method of claim 1, wherein the first point is determined using alignment marks.

3. The method of claim 1, wherein the inner diameter of the substrate is determined by a laser emitter and a photo-electric detector located above the substrate, wherein the photo-electric detector is positioned to receive light diffracted at an angle and provide a signal when a laser is incident on the substrate.

4. The method of claim 3, wherein the inner diameter of the substrate is determined by a change in the signal.

5. The method of claim 1, wherein features of the patterned layer are not concentrically imprinted about a center of the substrate.

6. The method of claim 1, wherein the shaft includes one or more stabilizers.

7. The method of claim 6, wherein the one or more stabilizers are movable.

8. The method of claim 6, wherein the stabilizers are placed adjacent to the inner edge of the substrate.

9. The method of claim 8, wherein the stabilizers provide for at least three points of contact on the substrate.

10. The method of claim 9, wherein at least two of the three points of contact are on the inner edge of the substrate.

11. The method of claim 9, wherein the three points of contact are on the inner edge of the substrate.

12. The method of claim 9, wherein at least one of the point of contact are is on an outer edge of the substrate.

13. The method of claim 6, wherein the stabilizers are integral to a substrate chuck, the substrate chuck holding the substrate during imprinting.

14. The method of claim 6, wherein the stabilizers are attachable to a substrate chuck, the substrate chuck holding the substrate during imprinting.

15. The method of claim 6, wherein positioning of the stabilizers is determined based on relative distance between each stabilizers and the first point.

16. The method of claim 15, wherein stabilizers are located equidistance from each other.

17. The method of claim 6, wherein the stabilizers are formed in a stepped pattern having multiple diameters.