Exposure method, exposure apparatus, and method for producing device
First Claim
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1. A lithographic projection apparatus, comprising:
- a substrate table that holds a substrate;
a projection system that projects a patterned beam of radiation onto a target portion of the substrate through a liquid in a space, the liquid having an optical property that can be adjusted;
a liquid supply system that has a first supply port and a second supply port; and
an adjustment device that adjusts the optical property of the liquid in the space, and controls temperatures of liquid to be supplied to the space from the first and second supply ports, respectively, such that a liquid at a first temperature is supplied to the space from the first supply port and a liquid at a second temperature, different from the first temperature, is supplied to the space from the second supply port.
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Abstract
A liquid immersion photolithography system has an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. In addition, a plurality of nozzles are arranged so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
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Citations
26 Claims
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1. A lithographic projection apparatus, comprising:
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a substrate table that holds a substrate; a projection system that projects a patterned beam of radiation onto a target portion of the substrate through a liquid in a space, the liquid having an optical property that can be adjusted; a liquid supply system that has a first supply port and a second supply port; and an adjustment device that adjusts the optical property of the liquid in the space, and controls temperatures of liquid to be supplied to the space from the first and second supply ports, respectively, such that a liquid at a first temperature is supplied to the space from the first supply port and a liquid at a second temperature, different from the first temperature, is supplied to the space from the second supply port. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A device manufacturing method, comprising:
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adjusting an optical property of a liquid in a space by providing a liquid at a first temperature to the space from a first supply port and providing a liquid at a second temperature different from the first temperature to the space from a second supply port different from the first supply port; and projecting a beam of radiation onto a target portion of a substrate through the liquid in the space. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification