Mask transport system configured to transport a mask into and out of a lithographic apparatus

• US 8,235,212 B2
• Filed: 06/12/2009
• Issued: 08/07/2012
• Est. Priority Date: 12/27/2002
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Heerens, Gert-Jan
• Primary Examiner(s): REYNOLDS, STEVEN ALAN
• Application Number:
  US12/483,940
• Publication Number:
  US 20090262327A1
• Time in Patent Office: 1,152 Days
• Field of Search: 206/454, 206/455, 206/722, 206/723, 206/710, 206/711, 206/521, 206/706, 206/724, 355/74, 355/30, 355/72, 355/75, 430/5, 220/580, 220/227, 220/23.87, 220/23.89, 220/366.1, 220/785, 414/939
• US Class Current: 206/454
• CPC Class Codes: G03F 1/66 Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 7/70983 Optical system protection, e.g. pellicles or removable covers for protection of mask

Abstract

A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

Claims

1. A mask transport system configured to transport a mask into and out of a lithographic apparatus, the mask transport system comprising:

a first container configured to shield a top side and a bottom side of the mask, the first container comprising a top portion configured to be connected to the top side of the mask, and a bottom portion configured to be connected to the bottom side of the mask, at least a portion of the first container being at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container; and

a second container configured to completely enclose the first container, the second container comprising a first part defining a first opening and an openable cover that covers said first opening, the cover being configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

2. The mask transport system according to claim 1, wherein the translucent part of the first container comprises glass.

3. The mask transport system according to claim 1, wherein the translucent part of the first container comprises plexiglass.

4. The mask transport system according to claim 1, wherein the first container further comprises a plurality of connectors configured to connect the top portion to the top side of the mask and to connect the bottom portion to the bottom side of the mask.

5. The mask transport system according to claim 4, wherein the connectors are at least partially porous to allow a pressure difference between the outside and the inside of the first container to be neutralized.

6. The mask transport system according to claim 4, wherein the first container further comprises a plurality of closing devices configured to connect the top portion and the bottom portion to the mask.

7. A mask transport system configured to transport a mask into and out of a lithographic apparatus, the mask transport system comprising:

a first container configured to shield a top side and a bottom side of the mask, at least a portion of the first container being at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container, the first container comprising a top portion, a bottom portion, and a plurality of connectors configured to connect the top portion and the bottom portion, wherein the connectors are at least partially porous to allow a pressure difference between the outside and, the inside of the first container to be neutralized; and

a second container configured to completely enclose the first container, the second container comprising a first part defining, a first opening and an openable cover that covers said first opening, the cover being configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

8. The mask transport system according to claim 7, wherein the translucent part of the first container comprises glass.

9. The mask transport system according to claim 7, wherein the translucent part of the first container comprises plexiglass.

10. A mask transport system configured to transport a mask into and out of a lithographic apparatus, the mask transport system comprising:

a first container configured to enclose the mask, the first container comprising a top portion, a bottom portion connected to the top portion, and a support configured to support the mask inside of the first container, at least one of the top portion and the bottom portion being at least partially translucent for the radiation having the predetermined wavelength used to detect contamination on the mask when the mask is enclosed by the first container; and

a second container configured to completely enclose the first container, the second container comprising a first part defining a first opening and an openable cover that covers said first opening, the cover being configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.

11. The mask transport system according to claim 10, wherein the first container further comprises a plurality of connectors configured to connect the top portion and the bottom portion, wherein the connectors are at least partially porous to allow a pressure difference between the outside and the inside of the first container to be neutralized.

12. The mask transport system according to claim 10, wherein the translucent part of the first container comprises glass.

13. The mask transport system according to claim 10, wherein the translucent part of the first container comprises plexiglass.