Antireflection structure and manufacturing method thereof

• US 8,236,433 B2
• Filed: 09/26/2008
• Issued: 08/07/2012
• Est. Priority Date: 03/26/2008
• Status: Active Grant

• Current Assignee: National Applied Research Laboratories (Government of The Republic of China)
• Original Assignee: National Applied Research Laboratories (Government of The Republic of China)
• Inventors: Chiu, Po-Kai, Cho, Wen-Hao, Chen, Hung-Ping, Pan, Han-Chang, Hsiao, Chien-Nan
• Primary Examiner(s): McNeil, Jennifer
• Assistant Examiner(s): Robinson, Lauren
• Application Number:
  US12/238,652
• Publication Number:
  US 20090246514A1
• Time in Patent Office: 1,411 Days
• Field of Search: 428/432, 428/426, 428/688, 428/699, 428/701, 428/702, 427/248.1, 427/255.15, 427/255.19, 427/255.7, 427/402, 427/419.1, 427/419.3
• US Class Current: 428/699
• CPC Class Codes: C23C 14/022 by means of bombardment with energetic particles or radiation
• CPC Class Codes: C23C 14/083 of refractory metals or yttrium
• CPC Class Codes: C23C 14/10 Glass or silica
• CPC Class Codes: C23C 14/546 using crystal oscillators
• CPC Class Codes: C23C 14/547 using optical methods
• CPC Class Codes: C23C 14/562 for coating elongated substrates
• CPC Class Codes: G02B 1/115 Multilayers
• CPC Class Codes: Y10T 428/265 1 mil or less

Abstract

An antireflection structure is provided. The antireflection structure includes a substrate layer having a substrate refractive index; a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, where a thickness of the first inorganic layer is in a range of 1 to 40 nm; and a second inorganic layer disposed on the first inorganic layer and having a second refractive index different from the first refractive index.

Claims

1. An antireflection structure, comprising:

a substrate layer having a substrate refractive index;

a first inorganic layer disposed on the substrate layer and having a first refractive index different from the substrate refractive index, wherein a thickness of the first inorganic layer is in a range of 1 to 40 nm;

a second inorganic layer disposed on the first inorganic layer and having a second refractive index smaller than the first refractive index;

a third inorganic layer disposed on the second inorganic layer, wherein the thickness of the third inorganic layer is in a range of 1 to 40 nm; and

a fourth inorganic layer disposed directly on the third inorganic layer, wherein the first and the third inorganic layers consist of a first material, and the second and the fourth inorganic layers consist of a second material different from the first material.

2. An antireflection structure according to claim 1, wherein:

the third inorganic layer has a third refractive index different from the second refractive index; and

the fourth inorganic layer has a fourth refractive index different from the third refractive index.

3. An antireflection structure, comprising:

a substrate layer having a substrate refractive index;

a first transparent layer disposed on the substrate layer and having a first refractive index;

a second transparent layer disposed on the first transparent layer and having a second refractive index;

wherein the first refractive index is larger than the substrate refractive index and the second refractive index, and a thickness of the first transparent layer is in the range of 1 to 40 nm;

a third transparent layer disposed on the second transparent layer, wherein the thickness of the third inorganic layer is in a range of 1 to 40 nm; and

a fourth transparent layer disposed directly on the third transparent layer, wherein the first and the third transparent layers consist of a first material, and the second and the fourth transparent layers consist of a second material different from the first material.

4. An antireflection structure according to claim 3, wherein:

the third transparent layer has a third refractive index; and

the fourth transparent layer has a fourth refractive index,

the third refractive index is larger than the second and fourth refractive indexes.

5. An antireflection structure according to claim 4, wherein the third transparent layer is made of a metal oxide.

6. An antireflection structure according to claim 5, wherein the metal oxide is one selected from a group consisting of indium oxide, titanium dioxide, nickel oxide, chromium oxide, cadmium oxide, gallium indium oxide, diniobium pentaoxide, indium tin oxide, tin dioxide and a combination thereof.

7. An antireflection structure according to claim 4, wherein the fourth refractive index is smaller than the substrate refractive index.

8. An antireflection structure according to claim 4, further comprising a coating layer disposed between any two layers of the first, second, third and fourth transparent layers.

9. An antireflection structure according to claim 4, further comprising an adhesive layer disposed between any two layers of the first, second, third and fourth transparent layers.

10. An antireflection structure according to claim 4, wherein the third and fourth transparent layers are made by a method of a vapor deposition.

11. An antireflection structure according to claim 3, wherein the first transparent layer is made of a metal oxide.

12. An antireflection structure according to claim 11, wherein the metal oxide is one selected from a group consisting of indium oxide, titanium dioxide, nickel oxide, chromium oxide, cadmium oxide, gallium indium oxide, diniobium pentaoxide, indium tin oxide, tin dioxide and a combination thereof.

13. An antireflection structure according to claim 11, wherein the second refractive index is smaller than the substrate refractive index.

14. An antireflection structure according to claim 3, wherein the first and the second transparent layers are made by a method of a vapor deposition.

15. A method for manufacturing an antireflection structure, comprising steps of:

providing a substrate layer with a substrate refractive index;

forming a first transparent layer with a first refractive index on the substrate layer; and

forming a second transparent layer with a second refractive index on the first transparent layer,

wherein the first refractive index is larger than the substrate reactive index and the second refractive index, and a thickness of the first transparent layer is in the range of 1 to 40 nm;

forming a third transparent layer on the second transparent layer, wherein the thickness of the third transparent layer is in a range of 1 to 40 nm;

forming a fourth transparent layer directly on the third transparent layer, wherein the first and the third transparent layers consist of a first material, and the second and fourth transparent layers consist of a second material different from the first material.

16. A method according to claim 15, further comprising

the third transparent layer has a third refractive index;

and

the fourth transparent layer has a fourth refractive index,

wherein the third refractive index is larger than the second and the fourth refractive indexes.

17. A method according to claim 16, further comprising a step of forming a coating layer between any two layers.

18. A method according to claim 16, further comprising a step of forming an adhesive layer between any two layers.

19. A method according to claim 15, wherein a method of forming the first, the second, the third and the fourth transparent layers comprises at least one selected from a group consisting of a coating, a physical vapor deposition and a chemical vapor deposition methods.

20. A method according to claim 15, further comprising at least one of steps of:

forming a coating layer between any two layers; and

forming an adhesive layer between any two layers.