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Exposure method, exposure apparatus, and device manufacturing method

  • US 8,236,467 B2
  • Filed: 04/28/2006
  • Issued: 08/07/2012
  • Est. Priority Date: 04/28/2005
  • Status: Expired due to Fees
First Claim
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1. An exposure method, comprising:

  • forming an immersion region on a substrate by supplying a liquid;

    measuring a contact time during which the liquid and the substrate are in contact;

    discarding the substrate when the contact time exceeds a tolerance value; and

    generating a notification that the contact time is about to exceed the tolerance value before the contact time exceeds the tolerance value.

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