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Fabrication method of topographically modulated microstructures using pattern homogenization with UV light

  • US 8,236,480 B2
  • Filed: 05/27/2008
  • Issued: 08/07/2012
  • Est. Priority Date: 05/24/2007
  • Status: Active Grant
First Claim
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1. A method of fabricating comprising the steps of:

  • creating a binary transparency mask;

    exposing a photoresist material to UV light through the binary transparency mask while holding the product of n×

    a>

    5500 μ

    m per unit of patterned area (in mm2) in the mask so that the pattern is transferred to the photoresist material as a homogeneous smooth surface, wherein n is the number of transparent pixels/mm2 and a is a pixel length (μ

    m); and

    creating a three dimensional microfluidic device from the exposed photoresist material;

    wherein the device includes at least one microchannel having an x, y, and z parameter.

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