Fabrication method of topographically modulated microstructures using pattern homogenization with UV light

• US 8,236,480 B2
• Filed: 05/27/2008
• Issued: 08/07/2012
• Est. Priority Date: 05/24/2007
• Status: Active Grant

• Current Assignee: National Institute of Standards and Technology (Government of the United States of America)
• Original Assignee: The United States of America As Represented By The Secretary of Commerce
• Inventors: Locascio, Laurie E., Atencia-Fernandez, Francisco Javier, Barnes, Susan, Douglas, Jack F.
• Primary Examiner(s): McPherson, John A.
• Application Number:
  US12/127,352
• Publication Number:
  US 20090155728A1
• Time in Patent Office: 1,533 Days
• Field of Search: None
• US Class Current: 430/320
• CPC Class Codes: B01F 25/433 Mixing tubes wherein the shape of the tube influences the mixing, e.g. mixing tubes with varying cross-section or provided with inwardly extending profiles
• CPC Class Codes: B01F 25/4331 Mixers with bended, curved, coiled, wounded mixing tubes or comprising elements for bending the flow
• CPC Class Codes: B01F 33/30 Micromixers
• CPC Class Codes: B01L 2300/0874 Three dimensional network
• CPC Class Codes: B01L 3/502707 characterised by the manufacture of the container or its components by shaping or joining plastic parts B29C59/00, B29C65/00; by laminating B32B37/00; manufacture of microstructural devices in general B81C
• CPC Class Codes: B81B 2201/058 Microfluidics not provided for in B81B2201/051 - B81B2201/054
• CPC Class Codes: B81C 2201/0157 Gray-scale mask technology
• CPC Class Codes: B81C 2201/019 Bonding or gluing multiple substrate layers
• CPC Class Codes: B81C 99/0085 using moulds and master templates, e.g. for hot-embossing
• CPC Class Codes: B81C 99/009 Manufacturing the stamps or the moulds
• CPC Class Codes: G03F 1/50 Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Abstract

A method for microfabrication of a microfluidic device having sub-millimeter three dimensional relief structures is disclosed. In this method, homogeneous surfaces, which do not exhibit apparent pixel geometry, emerge from the interaction of the overlapping of diffracted light under opaque pixels and the nonlinear polymerization properties of the photoresist material. The method requires a single photolithographic step and allows for the fabrication of microstructures over large areas (centimeters) with topographic modulation of features smaller than 100 micrometers. The method generates topography that is useful in a broad range of microfluidic applications.

Claims

1. A method of fabricating comprising the steps of:

creating a binary transparency mask;

exposing a photoresist material to UV light through the binary transparency mask while holding the product of n×

a>

5500 μ

m per unit of patterned area (in mm²) in the mask so that the pattern is transferred to the photoresist material as a homogeneous smooth surface, wherein n is the number of transparent pixels/mm² and a is a pixel length (μ

m); and

creating a three dimensional microfluidic device from the exposed photoresist material;

wherein the device includes at least one microchannel having an x, y, and z parameter.

2. The method of claim 1, further comprising the step of:

providing in the mask an opaque pixel with an overlapping of exponential decay in intensity from each edge due to diffraction.

3. The method of claim 1, further comprising the step of triggering in the photoresist material a continuous polymerized structure by a nonlinear nature of photopolymerization.

4. The method of claim 1, further comprising the step of utilizing tiling pattern units in the mask as repetitive motifs to define areas that transmit a same level of UV intensity.

5. The method of claim 1, further comprising the step of using swatches in the mask to provide for a distinct array of pixels where a relative density of transparent to opaque pixels determines an average UV light intensity transmitted.

6. The method of claim 1, further comprising the step of designing the mask with an array of circles filled with different patterns.

7. A method of fabricating a device comprising the steps of:

exposing a photoresist material to UV light through a mask with transparent and opaque pixels while holding the product of n×

a>

5500 μ

m per unit of patterned area (in mm²) in the mask, wherein n is the number of transparent pixels/mm² and a is a pixel length μ

m; and

fabricating from the photoresist material a three dimensional microfluidic device with a plurality of microstructures with a modulated topography while inducing a homogenization effect.

8. The method of claim 7, further comprising the step of fabricating a combinatorial set of polymerized structures in the photoresist material.

9. The method of claim 7, further comprising the step of tiling a circle in the mask with an 8×

4 pixel swatch.

10. The method of claim 7, further comprising the step of forming a swatch in the mask with a plurality of 8×

4 pixels that differ in average grayscale tone.

11. A method of fabricating a device comprising the steps of:

forming a swatch in a mask with a plurality of 8×

4 pixels that differ in average grayscale tone;

exposing a photoresist material to UV light through the mask with transparent and opaque pixels;

holding the product of n×

a>

5500 μ

m per unit of patterned area (in mm²) in the swatch so that the pattern is transferred to the photoresist material as a homogeneous smooth surface, wherein n is the number of transparent pixels/mm² and a is a pixel length (μ

m); and

fabricating from the photoresist material a three dimensional microfluidic device with a plurality of microstructures with a modulated topography while inducing a homogenization effect.

12. A method of fabricating a device comprising the steps of:

providing a mask with transparent and opaque pixels;

providing a photoresist material with an optical adhesive having low contrast;

subjecting the photoresist material to UV light;

promoting partial polymerization in areas of the photoresist material subject to diffracted UV light;

transferring discrete patterns from the mask as homogeneous patterns to the photoresist material while holding the product of n×

a>

5500 μ

m per unit of patterned area (in mm²) in the mask, wherein n is the number of transparent pixels/mm² and a is a pixel length (μ

m); and

creating at least one 3D microchannel in the photoresist material while inducing a homogenization effect.

13. The method of claim 12, further comprising the step of using a plurality of swatches as building blocks in a hierarchical design approach to create complex polymerized patterns.

14. The method of claim 12, further comprising the step of combining 8×

4 pixel swatches with 5×

1 swatches to produce a microchannel with a zigzag structure that is modulated in an x, y, and z direction.

15. The method of claim 12, further comprising the step of creating curved surfaces by designing incremental grayscale tones in adjacent small areas.

16. The method of claim 12, further comprising the step of exposing the photoresist material to enough UV light so that a polymer at a top surface of the material is in a compliant gel-like state and sticks to itself to thereby aid in smoothing transitions between surfaces created.

17. The method of claim 12, further comprising the step of generating semicircular microchannels by using swatches of 5×

1 pixels that are enlarged with graphic design software to form lines.

18. The method of claim 12, further comprising the step of increasing complexity of the microchannel with graphic software operations such as stretching, rotating, and skewing.

19. The method of claim 12, further comprising the steps of:

generating a 3D microchannel by skewing a second pattern 30 degrees from a first pattern and then overlaying the second pattern on top of the first to obtain a semi-circular microchannel with a semi-spiral ridge inside; and

creating an array of polymerized horns that is used to form microfluidic ejector nozzles in the device for creating monodisperse liquid droplets.