High-temperature spin-on temporary bonding compositions
First Claim
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1. A wafer bonding method comprising:
- providing a stack comprising first and second substrates bonded together via a bonding composition layer comprising a compound;
subjecting said stack to a temperature sufficient to soften said bonding layer; and
separating said first and second substrates, wherein said compound is selected from the group consisting of polymers and oligomers having a formula selected from the group consisting of
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Abstract
New compositions and methods of using those compositions as bonding compositions are provided. The compositions are preferably thermoplastic and comprise imides, amideimides, and/or amideimide-siloxanes (either in polymeric or oligomeric form) dispersed or dissolved in a solvent system, and can be used to bond an active wafer to a carrier wafer or substrate to assist in protecting the active wafer and its active sites during subsequent processing and handling. The compositions form bonding layers that are chemically and thermally resistant, but that can also be softened to allow the wafers to slide apart at the appropriate stage in the fabrication process.
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Citations
18 Claims
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1. A wafer bonding method comprising:
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providing a stack comprising first and second substrates bonded together via a bonding composition layer comprising a compound; subjecting said stack to a temperature sufficient to soften said bonding layer; and separating said first and second substrates, wherein said compound is selected from the group consisting of polymers and oligomers having a formula selected from the group consisting of - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification