Reduced pattern loading using bis(diethylamino)silane (C 8 H 22 N 2 Si) as silicon precursor
First Claim
1. A method for forming a conformal silicon oxide layer on a patterned substrate in a substrate processing region of a processing chamber, wherein the patterned substrate has a densely patterned region and a sparsely patterned region, the method comprising:
- flowing BDEAS into the substrate processing region;
flowing molecular oxygen (O2) into the substrate processing region;
flowing ozone (O3) with a restricted ozone flow rate into the substrate processing region; and
forming the conformal silicon oxide layer on the patterned substrate from the BDEAS, the molecular oxygen and the ozone by chemical vapor deposition, wherein the restricted ozone flow rate is selected such that a thickness of the conformal silicon oxide layer in the densely patterned region is within a conformality percentage of a thickness in the sparsely patterned region.
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Abstract
Aspects of the disclosure pertain to methods of depositing dielectric layers on patterned substrates. In embodiments, dielectric layers are deposited by flowing BIS(DIETHYLAMINO)SILANE (BDEAS), ozone and molecular oxygen into a processing chamber such that a relatively uniform dielectric growth rate is achieved across the patterned substrate surface. The deposition of dielectric layers grown according to embodiments may have a reduced dependence on pattern density while still being suitable for non-sacrificial applications.
255 Citations
14 Claims
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1. A method for forming a conformal silicon oxide layer on a patterned substrate in a substrate processing region of a processing chamber, wherein the patterned substrate has a densely patterned region and a sparsely patterned region, the method comprising:
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flowing BDEAS into the substrate processing region; flowing molecular oxygen (O2) into the substrate processing region; flowing ozone (O3) with a restricted ozone flow rate into the substrate processing region; and forming the conformal silicon oxide layer on the patterned substrate from the BDEAS, the molecular oxygen and the ozone by chemical vapor deposition, wherein the restricted ozone flow rate is selected such that a thickness of the conformal silicon oxide layer in the densely patterned region is within a conformality percentage of a thickness in the sparsely patterned region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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