Bipolar electrostatic chuck

• US 8,238,072 B2
• Filed: 01/21/2010
• Issued: 08/07/2012
• Est. Priority Date: 03/19/2004
• Status: Active Grant

• Current Assignee: Creative Technology Ltd.
• Original Assignee: Creative Technology Ltd.
• Inventors: Fujisawa, Hiroshi, Miyashita, Kinya
• Primary Examiner(s): Fureman, Jared
• Assistant Examiner(s): Ieva, Nicholas
• Application Number:
  US12/691,613
• Publication Number:
  US 20100149720A1
• Time in Patent Office: 929 Days
• Field of Search: 361/234
• US Class Current: 361/234
• CPC Class Codes: H01L 21/6833 Details of electrostatic chucks
• CPC Class Codes: H02N 13/00 Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Abstract

A bipolar electrostatic chuck which has excellent dielectric breakdown strength and provides excellent attracting performance. The bipolar electrostatic chuck eliminates difficulty in dismounting a sample from a sample attracting plane as much as possible after application of a voltage to electrodes is finished. The bipolar electrostatic chuck is provided with a first electrode and a second electrode in an insulator and permits a surface of the insulator to be the sample attracting plane. The insulator has the first electrode, an interelectrode insulating layer and the second electrode in this order from the sample attracting plane in the depth direction. The second electrode has a region not overlapping with the first electrode in a normal line direction of the sample attracting plane.

Claims

1. A method to attract a substrate comprising steps of:

providing a bipolar electrostatic chuck comprises;

a first electrode;

a second electrode; and

an insulating material comprising an upper insulating layer, an inter-electrode insulating layer, and a lower insulating layer, wherein

the upper insulating layer, the first electrode, the inter-electrode insulating layer, the second electrode, and the lower insulating layer are positioned in the order of distance from a substrate attracting plane,

the first electrode is formed in a comb-like configuration, and

when the insulating material is viewed from a side cross-sectional view, the first electrode has a plurality of gaps, and the second electrode has a plurality of areas that are not overlapped with the first electrode; and

applying voltage between the first electrode and second electrode, so as to generate electric lines of force which extend from the first electrode to the second electrode, though the gaps of the first electrode and reaching the substrate attracting plane, wherein the first and second electrodes are positioned in different horizontal planes, when said bipolar electrostatic chuck is viewed from a side cross sectional view, said electric lines of force generate a gradient force whereby the substrate is attracted to a surface of the insulating material as the substrate attracting plane, wherein

the second electrode is formed in a plane having a given planar area,

a part of the second electrode is overlapped with the first electrode in a normal line direction of the substrate attracting plane,

a electrode width (z) of the first electrode and an inter-electrode gap (z) of the first electrode are made equal to each other, (z) is in a range of 0.15 to 0.5 mm, and

the inter-electrode insulating layer has a thickness of 1 to 1000 μ

m.

3. The method of claim 1 or 2, wherein the insulating substrate is a glass substrate.

4. The method of claim 1 or 2, wherein a distance between the first electrode and the second electrode is equal to or more than 1 μ

m and equal to or less than 1000 μ

m.

5. The method of claim 1 or 2, wherein the inter-electrode insulating layer is formed of a resin layer made of one or more resins selected from the group consisting of polyimide, polyamide-imide, polyester, polyethylene terephthalate, epoxy, and acryl.

6. The method of claim 5, wherein the resin layer is formed of one or more resin films.

7. The method of claim 1 or 2, wherein the inter-electrode insulating layer is formed of a ceramic layer made of one or more elements selected from the group consisting of aluminum oxide, aluminum nitride, silicon carbide, silicon nitride, zirconia, and titania.

8. The method of claim 1 or 2, wherein the inter-electrode insulating layer is formed of one or two elements selected from the group consisting of silicon and silicon dioxide.

9. The method of claim 1 or 2, wherein

an electrically conductive layer is further formed on the surface of the insulating material, and

the surface of the electrically conductive layer serves as the substrate attracting plane.

10. The method of claim 1 or 2, wherein the upper insulating layer has a thickness of 10 to 200 μ

m.

2. A method to attract a substrate comprising steps of:

providing a bipolar electrostatic chuck comprises;

a first electrode;

a second electrode; and

an insulating material comprising an upper insulating layer, an inter-electrode insulating layer, and a lower insulating layer, wherein

the upper insulating layer, the first electrode, the inter-electrode insulating layer, the second electrode, and the lower insulating layer are positioned in the order of distance from a substrate attracting plane,

the first electrode is formed in a mesh configuration having a plurality of openings each within a given area,

the second electrode is formed in a plane having a given planar area, wherein a part of the second electrode is overlapped with the first electrode in a normal line direction of the substrate attracting plane, and

when the insulating material is viewed from a side cross-sectional view, the first electrode has a plurality of gaps, and the second electrode has a plurality of areas that are not overlapped with the first electrode; and

applying voltage between the first electrode and second electrode, so as to generate electric lines of force which extend from the first electrode to the second electrode, though the gaps of the first electrode and reaching the substrate attracting plane, wherein the first and second electrodes are positioned in different horizontal planes, when said bipolar electrostatic chuck is viewed from a side cross sectional view, said electric lines of force generate a gradient force whereby the substrate is attracted to a surface of the insulating material as the substrate attracting plane, wherein

a size of each of the openings of the first electrode is in a range of 0.1 to 3.0 mm, and

the inter-electrode insulating layer has a thickness of 1 to 1000 μ

m.