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Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby

  • US 8,239,786 B2
  • Filed: 12/22/2009
  • Issued: 08/07/2012
  • Est. Priority Date: 12/30/2008
  • Status: Expired due to Fees
First Claim
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1. A computer-implemented method comprising:

  • simulating a photolithography process using a design layout to produce a first simulated resist image;

    perturbing each edge segment in the design layout by a selected amount to produce an initial perturbed layout;

    simulating the photolithography process using the initial perturbed layout to produce a second simulated resist image;

    determining a difference resist image value between the first simulated resist image and the second simulated resist image for each edge segment;

    creating an n×

    n matrix J such that Δ

    RI=JΔ

    C, where Δ

    RI is an n×

    1 vector of changes in resist image values and Δ

    C is an n×

    1 vector of changes in segment locations;

    initializing the matrix J using the difference in resist image values divided by the perturbed amount;

    determining a correction delta vector Δ

    C by minimizing |JΔ

    C+RI|2



    C|2 subject to constraints imposed on Δ

    C, wherein the correction delta vector includes a correction delta value for each edge segment and α

    is a non-negative scalar;

    perturbing each edge segment in the perturbed layout by the corresponding correction delta value in the correction delta vector Δ

    C to create a further perturbed layout;

    simulating the photolithography process using the further perturbed layout to produce a third simulated resist image;

    using information from the third simulated resist image and the matrix J to produce an updated matrix J; and

    updating the correction delta vector Δ

    C by minimizing |JΔ

    C+RI|2



    C|2 subject to constraints imposed on Δ

    C, where the updated matrix J is used in the minimization, wherein terms of the updated matrix J represent interactions between neighboring edge segments, andwherein at least some of the steps of the method are performed using a computer.

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