Diaphragm isolation forming through subtractive etching
First Claim
Patent Images
1. A housing comprising:
- at least one sidewall, wherein the sidewall comprises inner and outer surfaces, the inner surface defining a portion of a boundary of an inside of the housing,an etch stop deposit disposed over at least a portion of the housing, anda diaphragm material deposit disposed over at least a portion of the etch stop deposit,wherein the at least a portion of the housing defines an etching such that at least part of the etch stop deposit is exposed to one of an outside of the housing or the inside of the housing through the etching.
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Accused Products
Abstract
Described herein is a housing comprising an inside and at least one sidewall, wherein the at least one sidewall comprises inner and outer surfaces. An etch stop deposit is disposed over at least a portion of the housing, and a diaphragm material deposit is disposed over at least a portion of the etch stop deposit.
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Citations
22 Claims
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1. A housing comprising:
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at least one sidewall, wherein the sidewall comprises inner and outer surfaces, the inner surface defining a portion of a boundary of an inside of the housing, an etch stop deposit disposed over at least a portion of the housing, and a diaphragm material deposit disposed over at least a portion of the etch stop deposit, wherein the at least a portion of the housing defines an etching such that at least part of the etch stop deposit is exposed to one of an outside of the housing or the inside of the housing through the etching. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 22)
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11. A structure comprising:
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front and back surfaces, a plurality of etch stop deposits disposed over at least a portion of the front surface, and a plurality of diaphragm material deposits each disposed over at least a portion of one of the etch stop deposits, wherein the structure defines etchings from the back surface to the front surface of the structure such that at least a part of each of the plurality of etch stop deposits is exposed from the back surface through the etchings. - View Dependent Claims (21)
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12. A method of isolating a diaphragm on a housing, the method comprising:
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depositing an etch stop deposit on at least a portion of the housing, depositing a diaphragm material deposit on at least a portion of the etch stop deposit, and removing at least a part of the at least the portion of the housing over which the etch stop deposit is deposited to expose the etch stop deposit to either an inside or an outside of the housing. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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19. A plate comprising:
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front and back surfaces, an etch stop deposit disposed on at least a portion of the front surface, and a diaphragm material deposit disposed over at least a portion of the etch stop deposit, wherein the plate defines an etching from the back surface to the front surface of the plate such that at least part of the etch stop deposit is exposed from the back surface through the etching. - View Dependent Claims (20)
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Specification