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Apparatus for high throughput chemical reactions

  • US 8,252,581 B2
  • Filed: 01/22/2008
  • Issued: 08/28/2012
  • Est. Priority Date: 01/22/2007
  • Status: Active Grant
First Claim
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1. An apparatus comprising at least one heating element, configured to be in thermal contact with a chip said chip comprising a substrate and an array of nanowells, wherein the number of nanowells is greater than 30,000, and wherein the array of nanowells comprises a plurality of individually controllable temperature zones corresponding to a plurality of heating elements, each temperature zone comprising a plurality of nanowells in the substrate, wherein the substrate has a thermal conductivity value higher than 1 W/mK, and each temperature zone being thermally isolated from one another.

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