Lithographic apparatus and device manufacturing method

• US 8,259,289 B2
• Filed: 06/29/2009
• Issued: 09/04/2012
• Est. Priority Date: 08/30/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Mulkens, Johannes Catharinus Hubertus, Munnig Schmidt, Robert-Han
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/493,592
• Publication Number:
  US 20090263734A1
• Time in Patent Office: 1,163 Days
• Field of Search: 355/30, 355/53
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.

Claims

1. A lithographic projection apparatus, comprising:

an array of individually controllable elements configured to modulate a cross-section of a radiation beam;

a projection system configured to project the modulated radiation beam onto a target portion of a substrate; and

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising;

a lower part configured to supply liquid to and remove liquid from a top surface of the substrate, the entire lower part having a first cross-sectional area, and

an upper part having a second cross sectional area and configured to supply liquid to and remove liquid from the second cross-sectional area comprising the remainder of the space in a plane substantially perpendicular to a direction of propagation of the beam, to which liquid is supplied between the upper and lower parts, the second cross-sectional area being greater than the first cross-sectional area.

2. The apparatus of claim 1, further comprising a controller configured to control a supply of liquid from the lower part to be substantially at such a rate that, in use, scanning movement of the substrate is effective to transport the liquid to an outlet without the need for a pump or low pressure source.

3. The apparatus of claim 1, wherein the upper part is configured to provide liquid to the space in a direction substantially perpendicular to the direction of propagation.

4. The apparatus of claim 1, wherein the lower part is configured to provide liquid in a direction with a component towards the substrate.

5. The apparatus of claim 1, wherein there is a step change from the second cross-sectional area to the first cross-sectional area.

6. A liquid supply system, comprising:

a lower part configured to supply liquid to and remove liquid from a top surface of a substrate, the entire lower part having a first cross-sectional area, and

an upper part having a second cross-sectional area and configured to supply liquid to and remove liquid from the second cross-sectional area comprising a remainder of a space between a projection system and the substrate, to which liquid is supplied between the upper and lower parts, the second cross-sectional area being greater than the first cross-sectional area.

7. The liquid supply system of claim 6, wherein the liquid is supplied in a plane substantially perpendicular to a direction of propagation of a radiation beam projected from the projection system.

8. The liquid supply system of claim 7, wherein the upper part is configured to provide liquid to the space in a direction substantially perpendicular to the direction of propagation.

9. The liquid supply system of claim 7, wherein a cross-section of the radiation beam is modulated by an array of individually controllable elements.

10. The liquid supply system of claim 6, further comprising a controller configured to control a supply of liquid from the lower part to be substantially at such a rate that, in use, scanning movement of the substrate is effective to transport the liquid to an outlet without the need for a pump or low pressure source.

11. The liquid supply system of claim 6, wherein the lower part is configured to provide liquid in a direction with a component towards the substrate.

12. The liquid supply system of claim 6, wherein there is a step change from the second cross-sectional area to the first cross-sectional area.