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Lithographic apparatus and device manufacturing method

  • US 8,259,289 B2
  • Filed: 06/29/2009
  • Issued: 09/04/2012
  • Est. Priority Date: 08/30/2006
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus, comprising:

  • an array of individually controllable elements configured to modulate a cross-section of a radiation beam;

    a projection system configured to project the modulated radiation beam onto a target portion of a substrate; and

    a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising;

    a lower part configured to supply liquid to and remove liquid from a top surface of the substrate, the entire lower part having a first cross-sectional area, andan upper part having a second cross sectional area and configured to supply liquid to and remove liquid from the second cross-sectional area comprising the remainder of the space in a plane substantially perpendicular to a direction of propagation of the beam, to which liquid is supplied between the upper and lower parts, the second cross-sectional area being greater than the first cross-sectional area.

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