Threshold determination in an inspection system
First Claim
1. A method for inspecting a surface of a semiconductor workpiece, the method comprising:
- providing a surface inspection system and using the surface inspection apparatus to cause laser light to impinge upon a test location on the workpiece surface and thereby cause the laser light to emerge from the surface as returned light comprising at least one of reflected light and scattered light;
collecting the returned light and generating a signal from the returned and collected light, the signal comprising a signal value representative of a characteristic of the workpiece surface at the test location;
providing a plurality of defect threshold candidates, the violation of which indicates the presence of a preexisting defect on the workpiece,receiving with the surface inspection system an input from a user, where the input represents a desired sensitivity for the inspection of the workpiece,causing the surface inspection system to automatically select a threshold from among the plurality of defect threshold candidates based on the input from the user and a plurality of prior signal values from secondary test locations, such that the threshold selected for the test location is different from the threshold selected for a different test location on the workpiece;
comparing the threshold to the signal value to obtain a difference value;
using the difference value to assess the characteristic of the workpiece surface at the test location; and
using the surface inspection system to automatically cause the method to be repeated for a plurality of test locations on the workpiece surface.
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Abstract
A method and system for inspecting a surface of a semiconductor workpiece comprises providing a surface inspection system and using the surface inspection apparatus to cause laser light to impinge upon a test location on the workpiece surface and thereby cause the laser light to emerge from the surface as returned light comprising at least one of reflected light and scatter light; collecting the returned light and generating a signal from the returned and collected light, the signal comprising a signal value representative of a characteristic of the workpiece surface at the test location; providing a plurality of threshold candidates and causing the surface inspection system to select a threshold from among the plurality of threshold candidates; comparing the threshold to the signal value to obtain a difference value; using the difference value to assess the characteristic of the workpiece surface at the test location; and using the surface inspection system to automatically cause the method to be repeated for a plurality of test locations on the workpiece surface.
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Citations
10 Claims
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1. A method for inspecting a surface of a semiconductor workpiece, the method comprising:
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providing a surface inspection system and using the surface inspection apparatus to cause laser light to impinge upon a test location on the workpiece surface and thereby cause the laser light to emerge from the surface as returned light comprising at least one of reflected light and scattered light; collecting the returned light and generating a signal from the returned and collected light, the signal comprising a signal value representative of a characteristic of the workpiece surface at the test location; providing a plurality of defect threshold candidates, the violation of which indicates the presence of a preexisting defect on the workpiece, receiving with the surface inspection system an input from a user, where the input represents a desired sensitivity for the inspection of the workpiece, causing the surface inspection system to automatically select a threshold from among the plurality of defect threshold candidates based on the input from the user and a plurality of prior signal values from secondary test locations, such that the threshold selected for the test location is different from the threshold selected for a different test location on the workpiece; comparing the threshold to the signal value to obtain a difference value; using the difference value to assess the characteristic of the workpiece surface at the test location; and using the surface inspection system to automatically cause the method to be repeated for a plurality of test locations on the workpiece surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A system for inspecting a surface of a semiconductor workpiece, the system comprising:
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a laser source that causes a laser light to impinge upon a test location on the workpiece surface and thereby cause the laser light to emerge from the surface as returned light comprising at least one of reflected light and scattered light; a collection subsystem that collects the returned light and generates a signal from the returned and collected light, the signal comprising a signal value representative of a characteristic of the workpiece surface at the test location; a processing device that, receives an input from a user, where the input represents a desired sensitivity for the inspection of the workpiece, causes the system to automatically select a threshold from among a plurality of defect threshold candidates, the violation of which indicates the presence of a preexisting defect on the workpiece, based on the input from the user and a plurality of prior signal values from secondary test locations, such that the threshold selected for the test location is different from the threshold selected for a different test location on the workpiece, compares the signal value to the threshold to obtain a difference value, that uses the threshold using the difference value to assess the characteristic of the workpiece surface at the test location; and uses the surface inspection system to automatically analyze the workpiece surface at a plurality of test locations.
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Specification