Method for improved patterning accuracy for thin film photovoltaic panels
First Claim
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1. A method for patterning a thin film photovoltaic panel, the method comprising:
- providing a substrate having a first edge opposing to a second edge, the substrate characterized by a compaction parameter;
forming a molybdenum material overlying the substrate;
forming a first plurality of patterns in the molybdenum material configured in a spatial configuration having a first inter-pattern spacing from the first edge to the second edge to form a first patterned structure overlying the substrate, wherein the first inter-pattern spacing is equal to a predetermined standard cell dimension plus an additional distance determined as a function of the compaction parameter;
forming a precursor material comprising at least copper bearing species and indium bearing species overlying the first patterned structure;
subjecting the substrate including the first patterned structure overlaid by the precursor material to one or more thermal processes to form at least an absorber structure and cause the substrate to change in dimension associated with the compaction parameter and subsequently to change the first inter-pattern spacing to a second inter-pattern spacing;
forming a window material overlying the absorber structure; and
scribing at least through one or more portions of the window material and the absorber structure at a position on the substrate shifted by a predetermined distance from one of the first plurality of patterns to cause formation of a second plurality of patterns characterized by a third inter-pattern spacing.
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Abstract
A method for patterning a thin film photovoltaic panel on a substrate characterized by a compaction parameter. The method includes forming molybdenum material overlying the substrate and forming a first plurality of patterns in the molybdenum material to configure a first patterned structure having a first inter-pattern spacing. Additionally, the method includes forming a precursor material comprising at least copper bearing species and indium bearing species overlying the first patterned structure. Then the substrate including the precursor material is subjected to a thermal processes to form at least an absorber structure.
230 Citations
18 Claims
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1. A method for patterning a thin film photovoltaic panel, the method comprising:
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providing a substrate having a first edge opposing to a second edge, the substrate characterized by a compaction parameter; forming a molybdenum material overlying the substrate; forming a first plurality of patterns in the molybdenum material configured in a spatial configuration having a first inter-pattern spacing from the first edge to the second edge to form a first patterned structure overlying the substrate, wherein the first inter-pattern spacing is equal to a predetermined standard cell dimension plus an additional distance determined as a function of the compaction parameter; forming a precursor material comprising at least copper bearing species and indium bearing species overlying the first patterned structure; subjecting the substrate including the first patterned structure overlaid by the precursor material to one or more thermal processes to form at least an absorber structure and cause the substrate to change in dimension associated with the compaction parameter and subsequently to change the first inter-pattern spacing to a second inter-pattern spacing; forming a window material overlying the absorber structure; and scribing at least through one or more portions of the window material and the absorber structure at a position on the substrate shifted by a predetermined distance from one of the first plurality of patterns to cause formation of a second plurality of patterns characterized by a third inter-pattern spacing. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method for pre-compensating patterns on thin film panels, the method comprising:
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providing a glass substrate characterized by a compaction ratio, the compaction ratio being dependent on one or more thermal cycles; forming a first film overlying the glass substrate; forming a first patterned structure in the first film the first patterned structure characterized by a first plurality of patterns having a first inter-pattern spacing pre-compensated by the compaction ratio; forming at least a second film overlying the first patterned structure; processing the second film through the one or more thermal cycles, the one or more thermal cycles transforming the first inter-pattern spacing to a second inter-pattern spacing while the substrate is being subjected to a compaction based on the compaction ratio; scribing at least two or more portions of the second film using a scribe device to form a second plurality of patterns, the scribe device including two or more mechanical tips having a pre-determined tip-to-tip separation substantially equal to the second inter-pattern spacing, each of the second plurality of patterns being respectively shifted a distance from one of the first plurality of patterns.
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Specification