Backside metal of redistribution line with silicide layer on through-silicon via of semiconductor chips
First Claim
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1. An integrated circuit structure comprising:
- a semiconductor substrate comprising a front side and a backside;
a through-silicon via (TSV) penetrating the semiconductor substrate, the TSV comprising a back end extending to the backside of the semiconductor substrate;
a redistribution line (RDL) over the backside of the semiconductor substrate and connected to the back end of the TSV;
a silicide layer over and adjoining the RDL;
an active circuit on the front side of the semiconductor substrate, wherein the active circuit and the RDL are on opposite sides of the semiconductor substrate;
a passivation layer over the RDL; and
an opening in the passivation layer, and directly over a portion of the RDL, wherein the opening penetrates through the silicide layer, and wherein the portion of the RDL is exposed through the opening.
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Abstract
An integrated circuit structure includes a semiconductor substrate having a front side and a backside. A through-silicon via (TSV) penetrates the semiconductor substrate. The TSV has a back end extending to the backside of the semiconductor substrate. A redistribution line (RDL) is over the backside of the semiconductor substrate and connected to the back end of the TSV. A silicide layer is over and contacting the RDL.
79 Citations
16 Claims
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1. An integrated circuit structure comprising:
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a semiconductor substrate comprising a front side and a backside; a through-silicon via (TSV) penetrating the semiconductor substrate, the TSV comprising a back end extending to the backside of the semiconductor substrate; a redistribution line (RDL) over the backside of the semiconductor substrate and connected to the back end of the TSV; a silicide layer over and adjoining the RDL; an active circuit on the front side of the semiconductor substrate, wherein the active circuit and the RDL are on opposite sides of the semiconductor substrate; a passivation layer over the RDL; and an opening in the passivation layer, and directly over a portion of the RDL, wherein the opening penetrates through the silicide layer, and wherein the portion of the RDL is exposed through the opening. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An integrated circuit structure comprising:
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a semiconductor substrate comprising a front side and a backside; a through-silicon via (TSV) penetrating the semiconductor substrate, the TSV comprising a back end extending beyond the backside of the semiconductor substrate; a redistribution line (RDL) over the backside of the semiconductor substrate and connected to the back end of the TSV, wherein the RDL comprises copper; a silicide layer over and adjoining the RDL, wherein the silicide layer comprises copper silicide; a passivation layer over and adjoining the RDL; an opening in the passivation layer and the silicide layer, wherein a portion of the RDL is exposed through the opening; a metal finish in the opening and contacting the RDL; and an active circuit on the front side of the semiconductor substrate, wherein the active circuit and the RDL are on opposite sides of the semiconductor substrate. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16)
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Specification