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Method and apparatus for pulsed plasma processing using a time resolved tuning scheme for RF power delivery

  • US 8,264,154 B2
  • Filed: 05/13/2009
  • Issued: 09/11/2012
  • Est. Priority Date: 05/14/2008
  • Status: Active Grant
First Claim
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1. An apparatus, comprising:

  • a first RF power supply having frequency tuning;

    a first matching network coupled to the first RF power supply; and

    a first common sensor for reading a reflected RF power reflected back to the first RF power supply and for providing a signal indicative of the reflected RF power to tune the first RF power supply and the first matching network.

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