Semiconductor device having a buried gate and method for manufacturing the same
First Claim
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1. A method of manufacturing a semiconductor device, comprising:
- forming a recess in a semiconductor substrate;
forming a first gate electrode pattern in a lower portion of the recess, the first gate electrode being a liner pattern over a bottom and a sidewall surface of the lower portion of the recess;
forming a second gate electrode pattern filling an upper portion of the recess and extending into the lower portion of the recess, the second gate electrode pattern being disposed over the first gate electrode pattern,wherein the second gate electrode pattern has a larger width in the upper portion of the recess than in the lower portion of the recess.
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Abstract
According to the present invention, a method of manufacturing a semiconductor device includes forming a recess on a semiconductor substrate, forming a first gate electrode material and a hard mask layer on an entire surface including the recess, etching the hard mask layer and the first gate electrode material to form the first gate electrode pattern on a lower portion of inside of the recess, forming a second gate electrode material on an entire surface including the recess, and etching the second gate electrode material and separating the second gate electrode material.
9 Citations
10 Claims
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1. A method of manufacturing a semiconductor device, comprising:
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forming a recess in a semiconductor substrate; forming a first gate electrode pattern in a lower portion of the recess, the first gate electrode being a liner pattern over a bottom and a sidewall surface of the lower portion of the recess; forming a second gate electrode pattern filling an upper portion of the recess and extending into the lower portion of the recess, the second gate electrode pattern being disposed over the first gate electrode pattern, wherein the second gate electrode pattern has a larger width in the upper portion of the recess than in the lower portion of the recess. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of manufacturing a semiconductor device, comprising:
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forming a recess in a semiconductor substrate; forming a first gate electrode material over an entire surface of the semiconductor substrate including the recess; etching the first gate electrode material to form a first gate electrode pattern in a lower portion of the recess; forming a second gate electrode material over the semiconductor substrate and the first gate electrode pattern in the lower portion of the recess; and etching the second gate electrode material to form a second gate electrode pattern, wherein the second gate electrode pattern has a larger width in an upper portion of the recess than in a lower portion of the recess, and wherein the first gate electrode pattern includes any selected from the group consisting of TiN, TaN, Ti, Ta, Mo, Al and a combination thereof.
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8. A method of manufacturing a semiconductor device, comprising:
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forming a recess in a semiconductor substrate, the recess having an upper portion and a lower portion; forming a first gate electrode material over the recess; etching the first gate electrode material to form a first gate electrode pattern over the lower portion of the recess, the first gate electrode pattern coating the lower portion of the recess; forming a second gate electrode material in the upper and lower portions of the recess; and etching the second gate electrode material to form a second gate electrode pattern extending at least partly into the lower portion of the recess, so that a portion of the second gate electrode pattern is coated with the first gate electrode pattern. - View Dependent Claims (9, 10)
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Specification