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Lithographic apparatus and device manufacturing method

  • US 8,279,405 B2
  • Filed: 02/19/2010
  • Issued: 10/02/2012
  • Est. Priority Date: 03/18/2002
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus, comprising:

  • a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation, the reflective optical elements including a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror;

    a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;

    a substrate table constructed and arranged to hold a substrate;

    a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; and

    a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror, and comprising a plurality of partially-opaque masking blades selectively interposable into the beam.

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