Lithographic apparatus and device manufacturing method

• US 8,279,405 B2
• Filed: 02/19/2010
• Issued: 10/02/2012
• Est. Priority Date: 03/18/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Dierichs, Marcel Mathijs Theodore Marie, Van Der Laan, Hans, Van Greevenbroek, Hendrikus Robertus Marie
• Primary Examiner(s): Nguyen, Hung Henry
• Assistant Examiner(s): Whitesell Gordon, Steven H
• Application Number:
  US12/709,151
• Publication Number:
  US 20100141918A1
• Time in Patent Office: 956 Days
• Field of Search: 355/53, 355/66, 355/67, 355/71, 359/618, 359/627, 359/857, 362/341, 362/346
• US Class Current: 355/71
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70091 Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/702 Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Abstract

A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.

Claims

1. A lithographic projection apparatus, comprising:

a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation, the reflective optical elements including a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror;

a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;

a substrate table constructed and arranged to hold a substrate;

a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; and

a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror, and comprising a plurality of partially-opaque masking blades selectively interposable into the beam.

2. The apparatus of claim 1, wherein at least one of the partially-opaque masking blades has a regular periodic arrangement of opaque and transparent areas having a pitch sufficiently large so as to cause negligible diffraction of the beam and covering substantially an entire facet or source image respectively.

3. The apparatus of claim 2, wherein the pitch is in the range of from 1 mm to 500 nm.

4. The apparatus of claim 2, wherein the facets of the first faceted mirror are arranged in lines and the plurality of partially-opaque blades comprises a plurality of partially-opaque fingers selectively extendible along respective lines of facets.

5. The apparatus of claim 1, wherein the facet mask is arranged proximate the first faceted mirror.

6. The apparatus of claim 1, wherein the facet mask is controllable to adjust the proportion of area of a facet that is obscured by the masking blade.

7. The apparatus of claim 1, wherein the facet mask further comprises a plurality of solid masking blades selectively interposable into the beam.

8. The apparatus of claim 1, wherein the second mirror is a faceted mirror.

9. A lithographic projection apparatus, comprising:

a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation, the reflective optical elements including a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror, wherein a group of adjacent facets of the first faceted mirror are arranged to direct radiation to an area of the second mirror, the area being arranged in a configuration selected from the group comprising;

a substantially annular configuration, a multipole configuration, a substantially circular configuration, and any combination of the above configurations;

a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the beam according to a desired pattern;

a substrate table constructed and arranged to hold a substrate;

a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate; and

a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror, and comprising a plurality of partially-opaque masking blades selectively interposable into the beam.

10. The apparatus of claim 9, wherein the second mirror is a faceted mirror and the area comprises a set of facets of the second faceted mirror.

11. The apparatus of claim 9, wherein facets near a periphery of the first faceted mirror are arranged to direct radiation to a centrally positioned area of the second mirror.