Magnetoresistance sensors for position and orientation determination

• US 8,283,921 B2
• Filed: 11/26/2008
• Issued: 10/09/2012
• Est. Priority Date: 11/26/2008
• Status: Active Grant

• Current Assignee: Stryker European Operations Holdings, LLC (Stryker Corporation)
• Original Assignee: General Electric Company
• Inventors: Huber, William H., Jensen, Vernon Thomas
• Primary Examiner(s): Ledynh, Bot
• Application Number:
  US12/324,169
• Publication Number:
  US 20100127696A1
• Time in Patent Office: 1,413 Days
• Field of Search: 324/207.21, 324/252, 338/32.R, 600/424
• US Class Current: 324/252
• CPC Class Codes: B82Y 25/00 Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
• CPC Class Codes: G01B 7/003 for measuring position, not involving coordinate determination coordinate measuring G01B7/004
• CPC Class Codes: G01R 33/093 using multilayer structures, e.g. giant magnetoresistance sensors thin magnetic films H01F10/00
• CPC Class Codes: G01R 33/095 extraordinary magnetoresistance sensors

Abstract

A magnetoresistance sensor for use in a position and orientation tracking system includes an insulating substrate, a pattern of a metal material and/or a semiconductor material deposited on a surface of the insulating substrate, and a bias magnet material deposited over the alternating pattern of a metal material and a semiconductor material. The position and orientation tracking system includes at least one magnetoresistance reference sensor attached to a fixed object, at least one magnetoresistance sensor attached to an object being tracked, and a processor coupled to the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor.

Claims

1. A magnetoresistance sensor for use with a position and orientation tracking system comprising:

an insulating substrate;

an alternating pattern of a metal material and a semiconductor material deposited on a surface of the insulating substrate; and

a bias magnet material deposited on a surface of the alternating pattern of the metal material and the semiconductor material;

wherein the alternating pattern of the metal material and the semiconductor material is between the insulating substrate and the bias magnet material.

2. The magnetoresistance sensor of claim 1, further comprising at least one input connection contact coupled to the metal material.

3. The magnetoresistance sensor of claim 1, further comprising at least one output connection contact coupled to the metal material.

4. The magnetoresistance sensor of claim 1, wherein the semiconductor material is connected in series to increase the resistance of the magnetoresistance sensor.

5. The magnetoresistance sensor of claim 1, wherein the semiconductor material is comprised of a single semiconductor element.

6. The magnetoresistance sensor of claim 1, wherein the bias magnet material subjects the semiconductor material to a magnetic field.

7. The magnetoresistance sensor of claim 6, wherein the magnetoresistance sensor provides a signal in response to a strength and a direction of the magnetic field.

8. The magnetoresistance sensor of claim 6, wherein the magnetic field increases the resistance of the magnetoresistance sensor.

9. The magnetoresistance sensor of claim 1, wherein the magnetoresistance sensor is approximately 0.1 mm by 0.1 mm in size.

10. A position and orientation tracking system comprising:

at least one magnetoresistance reference sensor attached to a fixed object;

at least one magnetoresistance sensor attached to an object being tracked; and

a processor coupled to the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor;

wherein the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor each comprising;

an insulating substrate;

an alternating pattern of a metal material and a semiconductor material deposited on a surface of the insulating substrate; and

a bias magnet material deposited on a surface of the alternating pattern of the metal material and the semiconductor material;

wherein the alternating pattern of the metal material and the semiconductor material is between the insulating substrate and the bias magnet material.

11. The position and orientation tracking system of claim 10, wherein the processor calculates the position and orientation of the object being tracked.

12. The position and orientation tracking system of claim 10, further comprising a user interface coupled to the processor.

13. The position and orientation tracking system of claim 12, wherein the user interface provides visualization of the position and orientation data to an operator.

14. The position and orientation tracking system of claim 10, wherein the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor are unaffected by the presence of a metallic distorter within the position and orientation tracking system.

18. The position and orientation tracking system of claim 10, wherein the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor are unaffected by the presence of a metallic distorter within the position and orientation tracking system.

15. A position and orientation tracking system comprising:

at least one magnetoresistance reference sensor attached to a fixed object;

at least one magnetoresistance sensor attached to an object being tracked;

a processor coupled to the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor; and

a user interface coupled to the processor;

wherein the at least one magnetoresistance reference sensor and the at least one magnetoresistance sensor each comprising;

an insulating substrate;

an alternating pattern of a metal material and a semiconductor material deposited on a surface of the insulating substrate; and

a bias magnet material deposited on a surface of the alternating pattern of the metal material and the semiconductor material;

wherein the alternating pattern of the metal material and the semiconductor material is between the insulating substrate and the bias magnet material.

16. The position and orientation tracking system of claim 15, wherein the processor calculates position and orientation data of the object being tracked.

17. The position and orientation tracking system of claim 15, wherein the user interface provides visualization of the position and orientation data to an operator.