Strain sensor

• US 8,286,497 B2
• Filed: 06/08/2010
• Issued: 10/16/2012
• Est. Priority Date: 06/25/2009
• Status: Active Grant

• Current Assignee: TSI Technolocies, LLC
• Original Assignee: TSI Technolocies, LLC
• Inventors: Clothier, Brian L., Sorkine, Evgeni
• Primary Examiner(s): Noori, Max
• Application Number:
  US12/796,322
• Publication Number:
  US 20110023620A1
• Time in Patent Office: 861 Days
• Field of Search: 737/60, 737/77, 737/79
• US Class Current: 73/779
• CPC Class Codes: G01B 7/24 using change in magnetic properties

Abstract

Improved microwire strain sensor elements (20, 40, 52, 62) and corresponding methods are provided, which permit accurate, wireless strain monitoring of a variety of structures, including composite structures, through use of a remote detector (28). The sensor elements (20, 40, 52, 62) have amorphous or nanocrystalline metallic alloy microwire cores (22, 48), which exhibit substantially reduced remagnetization responses when the sensor elements (20, 40, 52, 62) are coupled with a structure to be strain-monitored, and the structures are in an unstrained condition. When the monitored structure experiences a strain above a pre-selected threshold value, the microwire cores (22, 48) exhibit substantially different remagnetization responses as an indication that the monitored structure has experienced a strain above a strain threshold or over a range of strain. In use, the strain sensor elements (20, 40, 52, 62) are coupled with a structure to be monitored by application of the sensor elements (20, 40, 52, 62) to a surface of the structure, or by imbedding the sensor elements (20, 40, 52, 62) within the structure, and the coupled sensor elements are periodically interrogated by the detector (28). Preferably, the microwire cores (22, 48) are placed in compression in order to suppress the inherent remagnetization responses thereof by means of a surrounding body (26) or surrounding layers (44, 46) formed of synthetic resin material which shrinks upon curing. When the sensor elements (20, 40, 52, 62) are strained as a result of a strain experienced by the monitored structure, the remagnetization responses of the microwire cores (22, 48) are substantially increased.

Claims

1. A strain sensor assembly operable to detect a strain in a structure, comprising:

a sensor element comprising an elongated, amorphous or nanocrystalline sensing microwire operable to be coupled with said structure so that the sensing microwire is placed in tension when said structure is subjected to strain, said sensing microwire having a positive magnetostriction property, a first remagnetization response when said structure is in an unstrained condition, and a second remagnetization response substantially greater than said first remagnetization response when the structure is in a strained condition and said sensing microwire is placed in tension; and

a detector separate from said structure and including a transmitter unit operable to create an alternating magnetic field of sufficient magnitude to magnetically couple with said sensing microwire in order to interrogate said sensing microwire and induce a sensing microwire remagnetization response, and a remagnetization sensor operable to sense said sensing microwire remagnetization response,

whereby when said structure is in a strained condition, said remagnetization sensor will sense said second remagnetization response.

2. The assembly of claim 1, said sensing microwire comprising an amorphous or nanocrystalline microwire having said positive magnetostriction properties and being under axial compression sufficient to create said first remagnetization response.

3. The assembly of claim 2, said sensing microwire being glass-coated.

4. The assembly of claim 2, including a support for said sensing microwire which provides an axial compressive load to said sensing microwire.

5. The assembly of claim 4, said support selected from the group consisting of a synthetic resin body substantially surrounding said sensing microwire, a body of paper pulp substantially surrounding said sensing microwire, and a coating solvent-based coating material which shrinks upon drying.

6. The assembly of claim 1, said sensor element further including an outer sheath formed of shape memory material disposed substantially about said sensing microwire.

7. The assembly of claim 1, said sensor element including a reference microwire positioned proximal to said sensing microwire, said reference microwire having a coercivity substantially different than the coercivity of said sensing microwire and a remagnetization response which can be distinguished from the from the second remagnetization response of said sensing microwire regardless of the strained condition of said structure.

8. The assembly of claim 1, said sensor element being applied to or imbedded within said structure.

9. The assembly of claim 1, the voltage amplitude of said second remagnetization response being at least about five times greater than the voltage amplitude of said first remagnetization response.

10. The assembly of claim 1, the voltage amplitude of said first remagnetization response being substantially zero.

11. A method of detecting strain in a structure, comprising the steps of:

coupling a sensor element comprising an elongated, amorphous or nanocrystalline sensing microwire to said structure so that the sensing microwire is placed in tension when said structure is subjected to strain,

said sensing microwire having a positive magnetostriction property, a first remagnetization response when said structure is in an unstrained condition, and a second remagnetization response substantially greater than said first remagnetization response when the structure is in a strained condition and the sensing microwire is placed in tension;

interrogating said sensor element by creating an alternating magnetic field of sufficient magnitude to magnetically couple with said sensing microwire in order to induce a sensing microwire remagnetization response; and

sensing said sensing microwire remagnetization response as an indication of the strain condition of said structure.

12. The method of claim 11, said sensing microwire comprising an amorphous or nanocrystalline microwire having said positive magnetostriction properties and being under axial compression sufficient to create said first remagnetization response.

13. The method of claim 12, said sensing microwire being glass-coated.

14. The method of claim 12, said sensing microwire being on a support providing an axial compressive load to said sensing microwire.

15. The method of claim 14, said support selected from the group consisting of a synthetic resin body substantially surrounding said sensing microwire, a body of paper pulp substantially surrounding said sensing microwire, and a coating solvent-based coating material which shrinks upon drying.

16. The method of claim 11, said sensor element further including an outer sheath formed of shape memory material disposed substantially about said sensing microwire.

17. The method of claim 11, said sensor element including a reference microwire positioned proximal to said sensing microwire, said reference microwire having a coercivity substantially different than the coercivity of said sensing microwire and a remagnetization response which can be distinguished from the from the second remagnetization response of said sensing microwire regardless of the strained condition of said structure, said method further comprising the steps of causing said alternating magnetic field to interrogate said reference microwire in order to induce a reference microwire remagnetization response, detecting said reference microwire remagnetization response, and comparing the reference microwire remagnetization response to said sensing microwire remagnetization response.

18. The method of claim 11, said coupling step comprising the step of applying said sensor element to said structure, or imbedding said sensor element within said structure.

19. The method of claim 11, the voltage amplitude of said second remagnetization response being at least about five times greater than the voltage amplitude of said first remagnetization response.

20. The method of claim 11, the voltage amplitude of said first remagnetization response being substantially zero.

21. A strain sensor comprising:

a sensor element comprising an elongated, amorphous or nanocrystalline sensing microwire having a positive magnetostriction property and an inherent Barkhausen remagnetization response magnitude;

a shape memory material disposed about said sensor element; and

a body of material operably engaging said sensing microwire and operable to place the sensing microwire under compression sufficient to substantially reduce said remagnetization response to a first, reduced magnitude.

22. The sensor of claim 21, said sensing microwire having a glass coating.

23. The sensor of claim 21, said sensing microwire, when placed in tension above a predetermined value, having a second remagnetization response magnitude substantially greater than said first remagnetization response magnitude.

24. The sensor of claim 23, said second remagnetization response magnitude being said inherent Barkhausen remagnetization response magnitude.

25. The sensor of claim 21, said material comprising a synthetic resin.

26. The sensor of claim 21, said first, reduced magnitude remagnetization response being substantially zero.

27. The sensor of claim 21, said first and second remagnetization response magnitudes being induced when said sensor element is interrogated by a remote, alternating magnetic field detector.

28. The sensor of claim 21, including an auxiliary reference wire assembly operably coupled with said sensor element.

29. The sensor of claim 28, said auxiliary reference wire assembly comprising a second amorphous or nanocrystalline reference microwire having a coercivity different than that of the sensor element.

30. The sensor of claim 29, including structure surrounding said reference microwire operable to allow the reference microwire to move freely despite compressive, tensile, or other stresses experienced by the surrounding structure.

31. A strain sensor comprising:

a sensor element comprising an elongated, amorphous or nanocrystalline sensing microwire having a positive magnetostriction property and an inherent Barkhausen remagnetization response magnitude, and an auxiliary reference wire assembly operably coupled with said sensor element; and

a body of material operably engaging said sensing microwire and operable to place the sensing microwire under compression sufficient to substantially reduce said remagnetization response to a first, reduced magnitude.

32. The sensor of claim 31, said auxiliary reference wire assembly comprising a second amorphous or nanocrystalline reference microwire having a coercivity different than that of the sensor element.

33. The sensor of claim 32, including structure surrounding said reference microwire operable to allow the reference microwire to move freely despite compressive, tensile, or other stresses experienced by the surrounding structure.