Methods for avoiding parasitic capacitance in an integrated circuit package
DC CAFC- US 8,288,269 B2
- Filed: 10/04/2011
- Issued: 10/16/2012
- Est. Priority Date: 03/22/2006
- Status: Active Grant
First Claim
Patent Images
1. A method, comprising steps of:
- forming a first electrically conductive layer including a plurality of rows of contact pads;
forming an electrically insulating layer on the first electrically conductive layer; and
forming a second electrically conductive layer over the electrically insulating layer such that there is no intermediate conductive layer between the first and second electrically conductive layers, the second electrically conductive layer comprising metal and a plurality of cutouts wherein each cutout encloses an electrically insulating area within the second electrically conductive layer and wherein each electrically insulating area completely overlaps a corresponding one of the contact pads such that there is substantially no overlap of the rows of contact pads with metal in the second electrically conductive layer.
8 Assignments
Litigations
4 Petitions
Accused Products
Abstract
An integrated circuit package substrate includes a first and an additional electrically conductive layer separated from each other by an electrically insulating layer, a contact pad formed in the first electrically conductive layer for making a direct connection between the integrated circuit package substrate and a printed circuit board, and a cutout formed in the additional electrically conductive layer wherein the cutout encloses an area that completely surrounds the contact pad for avoiding parasitic capacitance between the additional electrically conductive layer and the printed circuit board.
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Citations
20 Claims
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1. A method, comprising steps of:
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forming a first electrically conductive layer including a plurality of rows of contact pads; forming an electrically insulating layer on the first electrically conductive layer; and forming a second electrically conductive layer over the electrically insulating layer such that there is no intermediate conductive layer between the first and second electrically conductive layers, the second electrically conductive layer comprising metal and a plurality of cutouts wherein each cutout encloses an electrically insulating area within the second electrically conductive layer and wherein each electrically insulating area completely overlaps a corresponding one of the contact pads such that there is substantially no overlap of the rows of contact pads with metal in the second electrically conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method, comprising steps of:
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forming a first layer including a plurality of rows of electrical contacts; forming a plurality of electrically conductive layers immediately proximate the first electrically conductive layer, each of the electrically conductive layers including a plurality of electrically insulating areas such that there is substantially no overlap of the rows of contact pads with metal in the plurality of electrically conductive layers; and forming a plurality of dielectric layers separating, respectively, the electrically conductive layers and the first layer from each other. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification