Devices with nanocrystals and methods of formation
First Claim
1. A non-volatile transistor comprising:
- a semiconductor substrate having at least two diffused regions with a diffusion type opposite of the substrate forming a source region and a drain region;
a channel region disposed between the source region and drain region;
a dielectric layer disposed above the channel region;
ion nucleation sites embedded in a surface of the dielectric layer opposite the channel region;
a plurality of electrically isolated nanocrystals disposed upon the dielectric layer, each electrically isolated nanocrystal of the plurality disposed from a respective ion implanted material of the ion nucleation sites, the ion implanted material being of a material different from the electrically isolated nanocrystals;
an inter-gate dielectric layer disposed above the plurality of electrically isolated nanocrystals;
a control gate electrode disposed above the inter-gate dielectric layer.
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Accused Products
Abstract
Devices can be fabricated using a method of growing nanoscale structures on a semiconductor substrate. According to various embodiments, nucleation sites are created on a surface of the substrate. The creation of the nucleation sites includes implanting ions with an energy and a dose selected to provide a controllable distribution of the nucleation sites across the surface of the substrate. Nanoscale structures can be grown using the controllable distribution of nucleation sites to seed the growth of the nanoscale structures. According to various embodiments, the nanoscale structures include at least one of nanocrystals, nanowires, and nanotubes. According to various nanocrystal embodiments, the nanocrystals are positioned within a gate stack and function as a floating gate for a nonvolatile device. Other embodiments are provided herein.
412 Citations
20 Claims
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1. A non-volatile transistor comprising:
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a semiconductor substrate having at least two diffused regions with a diffusion type opposite of the substrate forming a source region and a drain region; a channel region disposed between the source region and drain region; a dielectric layer disposed above the channel region; ion nucleation sites embedded in a surface of the dielectric layer opposite the channel region; a plurality of electrically isolated nanocrystals disposed upon the dielectric layer, each electrically isolated nanocrystal of the plurality disposed from a respective ion implanted material of the ion nucleation sites, the ion implanted material being of a material different from the electrically isolated nanocrystals; an inter-gate dielectric layer disposed above the plurality of electrically isolated nanocrystals; a control gate electrode disposed above the inter-gate dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A flash memory comprising:
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a semiconductor substrate having a plurality of structures, each structure including a pair of diffused regions forming a source and a drain; a channel region disposed between the source and the drain; a dielectric layer disposed above the channel region; ion nucleation sites embedded in a surface of the dielectric layer opposite the channel region; a plurality of electrically isolated nanocrystals disposed upon the dielectric layer, each electrically isolated nanocrystal of the plurality disposed from a respective ion implanted material of the ion nucleation sites, the ion implanted material being of a material different from the electrically isolated nanocrystals; an inter-gate dielectric layer disposed above the plurality of electrically isolated nanocrystals; and a control gate electrode disposed upon the inter-gate dielectric layer above the channel regions; and conductive signal lines interconnecting the plurality of control gate electrodes. - View Dependent Claims (10, 11, 12, 13, 14, 15)
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16. A memory comprising:
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a semiconductor substrate having at least two diffused regions with a diffusion type opposite of the substrate forming a source region and a drain region; a channel region disposed between the source region and drain region; a dielectric layer disposed above the channel region; ion nucleation sites embedded in a surface of the dielectric layer opposite the channel region; a first plurality of electrically isolated nanocrystals disposed upon the dielectric layer, each electrically isolated nanocrystal of the first plurality disposed from a respective ion implanted material of the ion nucleation sites, the ion implanted material being of a material different from the electrically isolated nanocrystals; a first inter-gate dielectric layer disposed above the first plurality of electrically isolated nanocrystals; a second plurality of electrically isolated nanocrystals disposed upon the first inter-gate dielectric layer; a second inter-gate dielectric layer disposed above the second plurality of electrically isolated nanocrystals; and a control gate electrode disposed above the second inter-gate dielectric layer. - View Dependent Claims (17, 18, 19, 20)
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Specification