Method for fabrication of a semiconductor device and structure

• US 8,294,159 B2
• Filed: 03/28/2011
• Issued: 10/23/2012
• Est. Priority Date: 10/12/2009
• Status: Expired due to Fees

• Current Assignee: Monolithic 3D, Inc.
• Original Assignee: Monolithic 3D, Inc.
• Inventors: Or-Bach, Zvi, Sekar, Deepak C., Cronquist, Brian, Beinglass, Israel, de Jong, Jan Lodewijk
• Primary Examiner(s): Rodela, Eduardo A
• Application Number:
  US13/073,268
• Publication Number:
  US 20110233676A1
• Time in Patent Office: 575 Days
• Field of Search: 257/66, 257/67, 257/69, 257/70, 257/74, 257/774, 257/797, 257/E27.064, 257/E21.61
• US Class Current: 257/74
• CPC Class Codes: H01L 21/76254 with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
• CPC Class Codes: H01L 21/8221 Three dimensional integrated circuits stacked in different levels
• CPC Class Codes: H01L 21/84 the substrate being other than a semiconductor body, e.g. being an insulating body
• CPC Class Codes: H01L 2224/16145 the bodies being stacked
• CPC Class Codes: H01L 2224/16225 the item being non-metallic, e.g. insulating substrate with or without metallisation
• CPC Class Codes: H01L 2224/32145 the bodies being stacked
• CPC Class Codes: H01L 2224/32225 the item being non-metallic, e.g. insulating substrate with or without metallisation
• CPC Class Codes: H01L 2224/45015 being circular
• CPC Class Codes: H01L 2224/45099 Material
• CPC Class Codes: H01L 2224/48091 Arched
• CPC Class Codes: H01L 2224/48227 connecting the wire to a bond pad of the item
• CPC Class Codes: H01L 2224/73204 the bump connector being embedded into the layer connector
• CPC Class Codes: H01L 2224/73265 Layer and wire connectors
• CPC Class Codes: H01L 23/36 Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks H01L23/28, H01L23/40, H01L23/42, H01L23/44, H01L23/46 take precedence; heating H01L23/345
• CPC Class Codes: H01L 23/481 Internal lead connections, e.g. via connections, feedthrough structures
• CPC Class Codes: H01L 24/48 of an individual wire connector
• CPC Class Codes: H01L 25/0657 Stacked arrangements of devices
• CPC Class Codes: H01L 27/0688 Integrated circuits having a three-dimensional layout
• CPC Class Codes: H01L 27/092 complementary MIS field-effect transistors
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/00012 : Relevant to the scope of the group, the symbol of which is combined with the symbol of this group
• CPC Class Codes: H01L 2924/00014 : the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
• CPC Class Codes: H01L 2924/01019 : Potassium [K]
• CPC Class Codes: H01L 2924/01066 : Dysprosium [Dy]
• CPC Class Codes: H01L 2924/01322 : Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
• CPC Class Codes: H01L 2924/10253 : Silicon [Si]
• CPC Class Codes: H01L 2924/12032 : Schottky diode
• CPC Class Codes: H01L 2924/12042 : LASER
• CPC Class Codes: H01L 2924/1301 : Thyristor
• CPC Class Codes: H01L 2924/1305 : Bipolar Junction Transistor [BJT]
• CPC Class Codes: H01L 2924/13062 : Junction field-effect transistor [JFET]
• CPC Class Codes: H01L 2924/13091 : Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
• CPC Class Codes: H01L 2924/14 : Integrated circuits
• CPC Class Codes: H01L 2924/15311 : being a ball array, e.g. BGA
• CPC Class Codes: H01L 2924/181 : Encapsulation
• CPC Class Codes: H01L 2924/207 : Diameter ranges
• CPC Class Codes: H01L 2924/3011 : Impedance
• CPC Class Codes: H03K 19/177 : arranged in matrix form
• CPC Class Codes: H10B 10/00 : Static random access memory [SRAM] devices
• CPC Class Codes: H10B 10/12 : comprising a MOSFET load element

Abstract

A method for fabrication of 3D semiconductor devices utilizing a layer transfer and steps for forming transistors on top of a pre-fabricated semiconductor device comprising transistors formed on crystallized semiconductor base layer and metal layer for the transistors interconnections and insulation layer. The advantage of this approach is reduction of the over all metal length used to interconnect the various transistors.

Claims

1. A semiconductor device comprising:

a first single crystal silicon layer comprising a plurality of first transistors and a plurality of first alignment marks;

at least two metal layers overlying said first single crystal silicon layer, wherein said metal layers comprise copper or aluminum more than other materials; and

a second thin single crystal silicon layer of less than 0.4 micron thickness overlying said at least two metal layers, wherein said second thin single crystal silicon layer comprises a plurality of second transistors, and wherein said second transistors comprise recessed channel transistors.

2. A semiconductor device according to claim 1, wherein said second thin single crystal silicon layer is constructed by a layer transfer process.

3. A semiconductor device according to claim 1, wherein said second transistors are annealed by an optical annealing.

4. A semiconductor device according to claim 1, wherein said at least two metal layers comprise a third metal layer overlying a second metal layer that overlies a first metal layer, wherein said third metal layer and said first metal layer each has an associated pitch that is tighter than a pitch associated with said second metal layer.

5. A semiconductor device according to claim 1, wherein said second transistors are aligned with said first alignment marks.

6. A semiconductor device according to claim 1, wherein said recessed channel transistors comprise P type transistors and N type transistors.

7. A semiconductor device according to claim 1, wherein said second single crystal silicon layer comprises a second alignment mark and wherein said second transistors are aligned with said first alignment marks by an offset, wherein said offset relates to a distance between one of said first alignment marks and said second alignment mark.