Method of fabricating a liquid crystal display device
First Claim
1. A method of fabricating a liquid crystal display device, comprising:
- providing first and second substrates;
forming a gate line on the first substrate, a lower gate pad electrode connected to the gate line, a lower data pad electrode, and a data link extended from the lower data pad electrode, using a first mask during a first mask process;
forming a gate insulating film on the first substrate, a semiconductor pattern on the gate insulating film, a data line crossing the gate line to define a pixel area on the semiconductor pattern, a source electrode, and a drain electrode using a second mask during a second mask process;
forming an organic insulating film on the data line, the source electrode and the drain electrode and forming a transmission hole passing through the organic insulating film, a gate pad contact hole exposing the lower gate pad electrode, a data pad contact hole exposing the lower data pad electrode, and a plurality of contact holes exposing the data link and the data line, using a third mask during a third mask process; and
forming a pixel electrode connected to the drain electrode, passing through the organic insulating film and the transmission hole, forming a reflective electrode on the pixel electrode in a reflective area of the pixel and exposing the pixel electrode in the transmission hole, forming an upper gate pad electrode connected to the lower gate pad electrode via the gate pad contact hole, forming an upper data pad electrode connected to the lower data pad electrode via the data pad contact hole, and forming a contact electrode connected to the data link and the data line through the plurality of contact holes, using a fourth mask during a fourth mask process, in which the contact electrode includes a transparent conductive film same as the pixel electrode and a reflective metal layer same as the reflective electrode,wherein the fourth mask process further comprises;
forming a transparent conductive film and a reflective metal layer on the organic insulating film;
forming first and second photo-resist patterns on the reflective metal layer using the fourth mask, wherein the first photo-resist pattern is thicker than that of the second photo-resist pattern;
patterning the transparent conductive film and the reflective metal layer by an etching using the first and the second photo-resist patterns as a mask to form a transparent conductive pattern and a reflective electrode, wherein the transparent conductive pattern has the pixel electrode, the upper pad electrode and the contact electrode, and the reflective electrode has an edge part same as the transparent conductive pattern;
removing the second photo-resist pattern and thinning the first photo-resist pattern;
removing the reflective electrode in the transmission hole and on the upper pad electrode by an etching using the first photo-resist pattern as a mask; and
removing the first photo-resist pattern.
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Accused Products
Abstract
The present invention relates to a transflective thin film transistor substrate and method of fabricating the same that is adaptive for simplifying its process. The liquid crystal display device includes: first and second substrates; a gate line on the first substrate; a gate insulating film on the first substrate; a data line crossing the gate line to define a pixel area; a thin film transistor connected to the gate line and the data line; an organic insulating film on the gate line, the data line and the thin film transistor, and having a transmission hole in the pixel area; a pixel electrode on the organic insulating film of the pixel area via the transmission hole and connected to the thin film transistor; and a reflective electrode on the pixel electrode having a same edge part as the pixel electrode or an edge part located at inner side from an edge part of the pixel electrode and exposing the pixel electrode of the transmission hole.
18 Citations
14 Claims
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1. A method of fabricating a liquid crystal display device, comprising:
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providing first and second substrates; forming a gate line on the first substrate, a lower gate pad electrode connected to the gate line, a lower data pad electrode, and a data link extended from the lower data pad electrode, using a first mask during a first mask process; forming a gate insulating film on the first substrate, a semiconductor pattern on the gate insulating film, a data line crossing the gate line to define a pixel area on the semiconductor pattern, a source electrode, and a drain electrode using a second mask during a second mask process; forming an organic insulating film on the data line, the source electrode and the drain electrode and forming a transmission hole passing through the organic insulating film, a gate pad contact hole exposing the lower gate pad electrode, a data pad contact hole exposing the lower data pad electrode, and a plurality of contact holes exposing the data link and the data line, using a third mask during a third mask process; and forming a pixel electrode connected to the drain electrode, passing through the organic insulating film and the transmission hole, forming a reflective electrode on the pixel electrode in a reflective area of the pixel and exposing the pixel electrode in the transmission hole, forming an upper gate pad electrode connected to the lower gate pad electrode via the gate pad contact hole, forming an upper data pad electrode connected to the lower data pad electrode via the data pad contact hole, and forming a contact electrode connected to the data link and the data line through the plurality of contact holes, using a fourth mask during a fourth mask process, in which the contact electrode includes a transparent conductive film same as the pixel electrode and a reflective metal layer same as the reflective electrode, wherein the fourth mask process further comprises; forming a transparent conductive film and a reflective metal layer on the organic insulating film; forming first and second photo-resist patterns on the reflective metal layer using the fourth mask, wherein the first photo-resist pattern is thicker than that of the second photo-resist pattern; patterning the transparent conductive film and the reflective metal layer by an etching using the first and the second photo-resist patterns as a mask to form a transparent conductive pattern and a reflective electrode, wherein the transparent conductive pattern has the pixel electrode, the upper pad electrode and the contact electrode, and the reflective electrode has an edge part same as the transparent conductive pattern; removing the second photo-resist pattern and thinning the first photo-resist pattern; removing the reflective electrode in the transmission hole and on the upper pad electrode by an etching using the first photo-resist pattern as a mask; and removing the first photo-resist pattern. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification