Exposure method, device manufacturing method, and substrate
First Claim
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1. An exposure method comprising exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein a concentration of an eluted substance in the liquid on the substrate satisfies the condition
RW−
- RP≦
1.0×
10−
3 where;
RP is a transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in an optical path direction of an exposure light, andRW is a transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light;
whereinthe exposing the substrate with exposure light is performed while supplying the liquid onto the substrate and recovering the liquid from on top of the substrate, andin order to satisfy the condition, at least one of an amount of the liquid supplied or an amount of the liquid recovered per unit time is adjusted.
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Abstract
An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition RW−RP≦1.0×10−3 when RP is the transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in the optical path direction of the exposure light, and RW is the transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light.
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Citations
23 Claims
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1. An exposure method comprising exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein a concentration of an eluted substance in the liquid on the substrate satisfies the condition
RW−- RP≦
1.0×
10−
3where; RP is a transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in an optical path direction of an exposure light, and RW is a transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light;
whereinthe exposing the substrate with exposure light is performed while supplying the liquid onto the substrate and recovering the liquid from on top of the substrate, and in order to satisfy the condition, at least one of an amount of the liquid supplied or an amount of the liquid recovered per unit time is adjusted. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
- RP≦
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11. An exposure method comprising:
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filling an optical path space of exposure light between a projection optical system and a substrate, and irradiating the exposure light onto the substrate via the projection optical system and a liquid to expose the substrate, wherein the concentration of an eluted substance in the liquid when an eluted substance has been eluted from the substrate into the liquid satisfies the condition
RP≧
Rrwhere; RP is the transmittance of the liquid that has been filled in the optical path space in an optical path direction of the exposure light, and Rr is a target transmittance that has been determined in advance;
whereinthe irradiating the exposure light onto the substrate is performed while supplying the liquid onto the substrate and recovering the liquid from on top of the substrate, and in order to satisfy the condition, at least one of an amount of the liquid supplied or an amount of the liquid recovered per unit time is adjusted. - View Dependent Claims (12, 13, 14, 15)
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16. An exposure method comprising:
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forming a liquid immersion area on a substrate, and irradiating exposure light onto the substrate via a liquid that forms the liquid immersion area to expose the substrate, wherein an allowable concentration of eluted substance eluted from the substrate in the liquid on the substrate is set that satisfies the condition
RW−
RP≦
1.0×
10−
2where; RP is a transmittance of the liquid containing the eluted substance eluted from the substrate per 1 mm in the optical path direction of the exposure light after a liquid immersion area has been formed on the substrate, and RW is a transmittance of the liquid before the eluted substance is eluted per 1 mm in the optical path direction of the exposure light. - View Dependent Claims (17, 18)
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19. An exposure method comprising:
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forming a liquid immersion area on a substrate, and irradiating exposure light onto the substrate via a liquid that forms the liquid immersion area and an optical member to expose the substrate, wherein an allowable concentration of an eluted substance eluted from the substrate in the liquid on the substrate is set that satisfies the condition
RG−
RG′
≦
1.0×
10−
3where; RG is a transmittance of the liquid contact surface of the optical member at a first point in time, and RG′
is a transmittance of the liquid contact surface of the optical member at a second point in time after a prescribed period of time has elapsed from the first point in time after coming into contact with the liquid that includes the eluted substance. - View Dependent Claims (20, 21, 22, 23)
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Specification
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Current AssigneeNikon Corporation
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Original AssigneeNikon Corporation
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InventorsNakano, Katsushi
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Primary Examiner(s)Nguyen, Hung Henry
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Assistant Examiner(s)Whitesell Gordon, Steven H
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Application NumberUS11/667,446Publication NumberTime in Patent Office2,538 DaysField of Search355/30, 355/53, 430/495.1, 430/270.1, 430/311, 430/913, 430/914, 430/919US Class Current355/30CPC Class CodesG03F 7/2041 in the presence of a fluid,...G03F 7/70341 Details of immersion lithog...
