Process of forming an electronic device including a trench and a conductive structure therein
First Claim
1. A process of forming an electronic device comprising:
- providing a workpiece including a first layer, a well region, and a buried doped region, wherein;
the first layer has a primary surface;
the well region lies adjacent to the primary surface; and
the buried doped region is spaced apart from the primary surface and the well region;
forming a first insulating layer over the primary surface;
forming a second insulating layer over the first insulating layer, wherein the second insulating layer has a different composition as compared to the first insulating layer;
forming a trench extending through the well region and towards the buried doped region, wherein;
forming the trench is performed after forming the first and second insulating layers; and
a portion of the well region and a portion of the first layer lie along a sidewall of the trench;
doping the portion of the first layer along the sidewall of the trench after forming the trench to form a sidewall doped region along the sidewall and below the well region, wherein;
a dopant for the sidewall doped region is introduced into the first layer along the sidewall of the trench, wherein the dopant has a conductivity type that is the same as the well region and opposite that of the first layer;
doping the portion of the first layer along the sidewall of the trench is performed using the dopant; and
doping the portion of the first layer comprises performing a tilt angle implant; and
forming an insulating sidewall spacer along the sidewall of the trench;
forming a conductive structure within the trench after forming the insulating sidewall spacer, wherein the conductive structure is electrically connected to the buried doped region and is electrically insulated from the sidewall doped region,wherein the electronic device comprises a transistor that includes a channel region within the well region.
4 Assignments
0 Petitions
Accused Products
Abstract
An electronic device can include a first layer having a primary surface, a well region lying adjacent to the primary surface, and a buried doped region spaced apart from the primary surface and the well region. The electronic device can also include a trench extending towards the buried doped region, wherein the trench has a sidewall, and a sidewall doped region along the sidewall of the trench, wherein the sidewall doped region extends to a depth deeper than the well region. The first layer and the buried region have a first conductivity type, and the well region has a second conductivity type opposite that of the first conductivity type. The electronic device can include a conductive structure within the trench, wherein the conductive structure is electrically connected to the buried doped region and is electrically insulated from the sidewall doped region. Processes for forming the electronic device are also described.
24 Citations
15 Claims
-
1. A process of forming an electronic device comprising:
-
providing a workpiece including a first layer, a well region, and a buried doped region, wherein; the first layer has a primary surface; the well region lies adjacent to the primary surface; and the buried doped region is spaced apart from the primary surface and the well region; forming a first insulating layer over the primary surface; forming a second insulating layer over the first insulating layer, wherein the second insulating layer has a different composition as compared to the first insulating layer; forming a trench extending through the well region and towards the buried doped region, wherein; forming the trench is performed after forming the first and second insulating layers; and a portion of the well region and a portion of the first layer lie along a sidewall of the trench; doping the portion of the first layer along the sidewall of the trench after forming the trench to form a sidewall doped region along the sidewall and below the well region, wherein; a dopant for the sidewall doped region is introduced into the first layer along the sidewall of the trench, wherein the dopant has a conductivity type that is the same as the well region and opposite that of the first layer; doping the portion of the first layer along the sidewall of the trench is performed using the dopant; and doping the portion of the first layer comprises performing a tilt angle implant; and forming an insulating sidewall spacer along the sidewall of the trench; forming a conductive structure within the trench after forming the insulating sidewall spacer, wherein the conductive structure is electrically connected to the buried doped region and is electrically insulated from the sidewall doped region, wherein the electronic device comprises a transistor that includes a channel region within the well region. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A process of forming an electronic device comprising:
-
providing a workpiece including a first layer, a well region, a well contact region, a source region, a buried doped region, and a gate electrode, wherein; the first layer has a primary surface; the well region lies adjacent to the primary surface; the well contact region lies adjacent to the primary surface and within the well region and has a higher peak doping concentration as compared to the well region; the source region lies adjacent to the primary surface and within the well region and has a higher peak doping concentration as compared to the well region; the buried doped region is spaced apart from the primary surface and the well region; the gate electrode overlies the first layer and the well region; the first layer, the source region, and the buried doped region have a first conductivity type; and the well region and the well contact region have a second conductivity type opposite that of the first conductivity type; etching a trench extending to the buried doped region, wherein portions of the first layer and the well region lie along a sidewall of the trench; implanting a dopant into first layer along the sidewall of the trench; depositing an insulating layer into the trench; anisotropically etching the insulating layer to form a sidewall spacer along the sidewall of the trench; depositing a conductive layer to fill a remaining portion of the trench; polishing the conductive layer to form a conductive structure, wherein; polishing removes a portion of the conductive layer that overlies the source region and the gate electrode; and the sidewall spacer lies between the conductive structure and the sidewall of the trench; and forming a first interconnect, a second interconnect, and a third interconnect, wherein; the first interconnect is electrically connected to the conductive structure; the second interconnect is electrically connected to the well contact region and the source region; and the third interconnect is electrically connected to the gate electrode. - View Dependent Claims (9)
-
-
10. A process of forming an electronic device comprising:
-
providing a workpiece including a first layer, a well region, and a buried doped region, wherein; the first layer has a primary surface; the well region lies adjacent to the primary surface; and the buried doped region is spaced apart from the primary surface and the well region; forming a gate electrode that overlies the well region and the first layer at the primary surface; forming a source region within the well region and adjacent to the primary surface; forming a well contact region within the well region and adjacent to the primary surface, wherein the well contact region has a higher peak dopant concentration as compared to the well region; forming a trench extending towards the buried doped region, wherein a portion of the first layer lies along a sidewall of the trench, and wherein forming the trench is performed after forming the gate electrode; doping the portion of the first layer along the sidewall of the trench to form a sidewall doped region, wherein; dopant for the sidewall doped region is introduced into the first layer along the sidewall of the trench; doping is performed after forming the trench; and the sidewall doped region is spaced apart from the buried doped region; and forming a conductive structure within the trench, wherein the conductive structure is electrically connected to the buried doped region and is electrically insulated from the sidewall doped region. - View Dependent Claims (11, 12, 13, 14, 15)
-
Specification