Method of forming an MOS transistor
First Claim
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1. A method of forming an MOS transistor comprising:
- providing a semiconductor substrate;
forming the MOS transistor on the semiconductor substrate including forming the MOS transistor with an active region and a termination region that is external to the active region;
forming an active trench in the active region;
forming a first trench and a second trench within the termination region;
forming a first conductor within the termination region and overlying the first trench wherein the first conductor is electrically connected to a second conductor within the first trench; and
forming the second conductor to electrically contact a third conductor that is within the active trench.
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Abstract
In one embodiment, a method of forming an MOS transistor includes forming the MOS transistor to have an active region and a termination region. Within the termination region the method includes forming a plurality of trenches having a conductor within the plurality of trenches. The method also includes forming another conductor to make electrical contact to one of the conductors within the plurality of trenches.
11 Citations
15 Claims
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1. A method of forming an MOS transistor comprising:
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providing a semiconductor substrate; forming the MOS transistor on the semiconductor substrate including forming the MOS transistor with an active region and a termination region that is external to the active region; forming an active trench in the active region; forming a first trench and a second trench within the termination region; forming a first conductor within the termination region and overlying the first trench wherein the first conductor is electrically connected to a second conductor within the first trench; and forming the second conductor to electrically contact a third conductor that is within the active trench. - View Dependent Claims (2, 3, 4, 5, 6, 13)
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7. A method of forming a transistor comprising:
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providing a semiconductor substrate having a surface; forming a plurality first trenches in an active region of the transistor; forming a second trench and a third trench extending into the semiconductor substrate including forming the second trench and the third trench in a termination region of the transistor that is not in the active region of the transistor; forming a first conductor within the second trench; forming a second conductor within the third trench; forming a third conductor overlying the surface of the semiconductor substrate and overlying the second trench and electrically contacting the first conductor; and forming the first conductor electrically connected to a fourth conductor within at least one trench of the plurality of first trenches. - View Dependent Claims (8, 9, 10, 11, 12, 14, 15)
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Specification