Exposure apparatus and device manufacturing method
First Claim
Patent Images
1. An exposure apparatus that exposes a substrate via a liquid, comprising:
- a measuring system, which has a first pattern formed on a prescribed surface; and
second area defined in a vicinity of a first area on the prescribed surface, the first area including the first pattern, andwherein a second pattern is formed in the second area so that the liquid that has remained and extended over the first area and the second area retreats from the first area and collects in the second area.
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Abstract
Provided is an exposure apparatus that is able to prevent liquid from remaining on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).
111 Citations
58 Claims
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1. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a measuring system, which has a first pattern formed on a prescribed surface; and second area defined in a vicinity of a first area on the prescribed surface, the first area including the first pattern, and wherein a second pattern is formed in the second area so that the liquid that has remained and extended over the first area and the second area retreats from the first area and collects in the second area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a measuring system, in which a measuring part is arranged on a prescribed surface; a first area defined on the prescribed surface so as to include the measuring part; and a second area defined in the vicinity of the first area on the prescribed surface, and wherein a prescribed processing is performed on a surface of the first area or a surface of the second area or both so that the liquid that has remained and extended over the first area and the second area retreats from the first area and collects in the second area. - View Dependent Claims (20, 21, 22, 23, 24, 25)
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26. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a measuring system, in which a measuring part is arranged on a prescribed surface; a first area defined on the prescribed surface so as to include the measuring part; and a second area defined on the prescribed surface that is larger than the first area so as to surround the first area, and wherein the first area is defined at a position separated from a center of the second area so that the liquid that has remained and extended over the first area and the second area retreats from the first area and collects in the second area. - View Dependent Claims (27)
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28. An exposure apparatus that exposes a substrate via a liquid comprising:
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a measuring system, in which a measuring part is arranged on a prescribed surface; and a first area defined on the prescribed surface so as to include the measuring part, and wherein a flow of gas is produced onto the first area so that the liquid that has remained in the first area retreats from the first area, and a gas supply port that produces the gas flow that is substantially parallel to a surface of the first area is provided in a vicinity of the first area. - View Dependent Claims (29, 30, 31, 32, 33, 34, 35, 36)
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37. An exposure apparatus that exposes a substrate via a liquid, comprising:
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a measuring system, in which a measuring part is arranged on a prescribed surface; a first area defined on the prescribed surface so as to include the measuring part; and a second area in a vicinity of the first area, and wherein a liquid repellent film is formed on the surface of the second area, and a liquid repellent film is not formed on the surface of the first area. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58)
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Specification