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Electroless deposition process on a silicon contact

  • US 8,308,858 B2
  • Filed: 01/18/2010
  • Issued: 11/13/2012
  • Est. Priority Date: 03/18/2005
  • Status: Active Grant
First Claim
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1. A composition of an activation solution, comprising:

  • a cobalt source at a concentration within a range from about 1 mM to about 100 mM;

    a fluoride source at a concentration within a range from about 10 mM to about 400 mM; and

    a hypophosphite source at a concentration within a range from about 5 mM to about 150 mM.

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