Functionally-graded three-dimensional ordered open-cellular microstructure and method of making same

• US 8,315,499 B1
• Filed: 04/09/2012
• Issued: 11/20/2012
• Est. Priority Date: 12/18/2008
• Status: Active Grant

• Current Assignee: HRL Laboratories LLC (The Boeing Co.)
• Original Assignee: HRL Laboratories LLC (The Boeing Co.)
• Inventors: Jacobsen, Alan J., Olson, Gregory L.
• Primary Examiner(s): ROJAS, OMAR R
• Application Number:
  US13/442,777
• Time in Patent Office: 225 Days
• Field of Search: 385/146, 264/1.27
• US Class Current: 385/146
• CPC Class Codes: B33Y 10/00 Processes of additive manufacturing
• CPC Class Codes: B33Y 30/00 Apparatus for additive manufacturing; Details thereof or accessories therefor
• CPC Class Codes: G02B 6/10 of the optical waveguide type G02B6/02, G02B6/24 take precedence; devices or arrangements for the control of light by electric, magnetic, electro-magnetic or acoustic means G02F1/00; transferring the modulation of modulated light G02F2/00; optical logic elements G02F3/00; optical analogue/digital converters G02F7/00
• CPC Class Codes: G02B 6/138 by using polymerisation
• CPC Class Codes: G03F 7/0037 Production of three-dimensional images

Abstract

A method for creating or forming a functionally graded 3D ordered open-cellular microstructure, and a functionally graded 3D ordered open-cellular microstructure. In one embodiment, the functionally-graded three-dimensional ordered open-cellular microstructure includes a first three-dimensional interconnected pattern of polymer waveguides having a first three-dimensional pattern; a second three-dimensional interconnected pattern of polymer waveguides having a second three-dimensional pattern differing from the first three-dimensional pattern; and an interface connected with the first three-dimensional interconnected pattern of polymer waveguides and the second three-dimensional interconnected pattern of polymer waveguides. Here, the term “functionally graded” refers to a spatial variation in the physical microstructure—and thus the properties—through the thickness of the material.

Claims

1. A method for forming a functionally-graded three-dimensional ordered open-cellular microstructure, the method comprising:

securing a volume of photo-monomer;

exposing the volume of photo-monomer to a first three-dimensional light pattern and a second three-dimensional light pattern differing from the first three-dimensional light pattern, wherein the first three-dimensional light pattern and the second three-dimensional light pattern are exposed on opposite exposure surfaces of the volume of photo-monomer, wherein the first three-dimensional light pattern creates a first three-dimensional interconnected pattern of polymer waveguides in the volume of photo-monomer, wherein the second three-dimensional light pattern creates a second three-dimensional interconnected pattern of polymer waveguides in the volume of photo-monomer, and wherein an exposure energy of each of the light patterns is sufficient to at least connect the first three-dimensional interconnected pattern of polymer waveguides to the second three-dimensional interconnected pattern of polymer waveguides; and

removing any uncured photo-monomer to leave behind the functionally-graded three-dimensional ordered open-cellular microstructure.

2. The method of claim 1, wherein the exposure energy of each of the light patterns determines a thickness into the volume of photo-monomer of each of the interconnected patterns of polymer waveguides originating from a respective one of the exposure surfaces of the photo-monomer.

3. The method of claim 1, wherein the exposing the volume of photo-monomer to the first three-dimensional light pattern and the second three-dimensional light pattern comprises:

securing a first mask at a first one of the opposite exposure surfaces of the volume of photo-monomer, the first mask having a plurality of first apertures arranged in a first mask pattern; and

securing a second mask at a second one of the opposite exposure surfaces of the volume of photo-monomer, the second mask having a plurality of second apertures arranged in a second mask pattern differing from the first mask pattern.

4. The method of claim 3, wherein the securing the first mask at the first one of the opposite exposure surfaces of the photo-monomer comprises placing the first mask between a first collimated light source and the first one of the opposite exposure surfaces of the photo-monomer, and wherein the securing the second mask at the second one of the opposite exposure surfaces of the photo-monomer comprises placing the second mask between a second collimated light source and the second one of the opposite exposure surfaces of the photo-monomer.

5. The method of claim 4, wherein the exposing the volume of photo-monomer to the first three-dimensional light pattern and the second three-dimensional light pattern further comprises:

directing a plurality of first collimated light beams from the first collimated light source to the first mask for a period of exposure time such that a portion of the first collimated light beams passes through the plurality of first apertures of the first mask into the photo-monomer to form the first three-dimensional interconnected pattern of polymer waveguides through a first portion of the volume of the photo-monomer; and

directing a plurality of second collimated light beams from the second collimated light source to the second mask for a period of exposure time such that a portion of the second collimated light beams passes through the plurality of second apertures of the first mask into the photo-monomer to form the second three-dimensional interconnected pattern of polymer waveguides through a second portion of the volume of the photo-monomer.

6. The method of claim 5, wherein the directing the plurality of first collimated light beams from the first collimated light source to the first mask comprises directing a first one of the plurality of first collimated light beams at a first angle with respect to the first mask, directing a second one of the plurality of first collimated light beams at a second angle with respect to the first mask, and directing a third one of the plurality of first collimated light beams at a third angle with respect to the first mask;

wherein the directing the plurality of second collimated light beams from the second collimated light source to the second mask comprises directing a first one of the plurality of second collimated light beams at a fourth angle with respect to the second mask, directing a second one of the plurality of second collimated light beams at a fifth angle with respect to the second mask, and directing a third one of the plurality of second collimated light beams at a sixth angle with respect to the second mask.

7. The method of claim 6, wherein the first angle is different from the fourth angle, the second angle is different from the fifth angle, and/or the third angle is different from the sixth angle, and wherein the plurality of first apertures is substantially identical in number to the plurality of second apertures.

8. The method of claim 6, wherein the first angle is substantially identical to the fourth angle, the second angle is substantially identical to the fifth angle, and the third angle is substantially identical to the sixth angle, and wherein the plurality of first apertures is different in number to the plurality of second apertures.

9. The method of claim 6, wherein the first angle is different from the fourth angle, the second angle is different from the fifth angle, and/or the third angle is different from the sixth angle, and wherein the plurality of first apertures is different in number to the plurality of second apertures.

10. The method of claim 6, wherein the first collimated light source comprises three or more light sources adapted to produce the first, second and third ones of the plurality of first collimated light beams, and wherein the second collimated light source comprises three or more light sources adapted to respectively produce the first, second and third ones of the plurality of second collimated light beams.

11. The method of claim 10, wherein the first three-dimensional interconnected pattern of polymer waveguides and the second three-dimensional interconnected pattern of polymer waveguides are formed from a concurrent exposure of the first, second and third ones of the plurality of first collimated light beams and the first, second and third ones of the plurality of second collimated light beams.

12. The method of claim 4, wherein the exposing the volume of photo-monomer to the first three-dimensional light pattern and the second three-dimensional light pattern further comprises:

directing three or more first collimated light beams from the first collimated light source to the first mask for a period of exposure time such that a portion of the first collimated light beams passes through the plurality of first apertures of the first mask into the photo-monomer to form the first three-dimensional interconnected pattern of polymer waveguides through a first portion of the volume of the photo-monomer; and

directing three or more second collimated light beams from the second collimated light source to the second mask for a period of exposure time such that a portion of the second collimated light beam passes through the plurality of second apertures of the second mask into the photo-monomer to form the second three-dimensional interconnected pattern of polymer waveguides through a second portion of the volume of the photo-monomer.

13. The method of claim 1, wherein the second three-dimensional interconnected pattern of polymer waveguides is formed entirely within the first three-dimensional interconnected pattern of polymer waveguides.

14. The method of claim 13, wherein the first three-dimensional interconnected pattern of polymer waveguides and the second three-dimensional interconnected pattern of polymer waveguides are substantially identical in volume.

15. The method of claim 1, wherein the second three-dimensional interconnected pattern of polymer waveguides has a first portion formed within the first three-dimensional interconnected pattern of polymer waveguides and a second portion formed outside of the first three-dimensional interconnected pattern of polymer waveguides.

16. A system for forming a functionally-graded three-dimensional ordered open-cellular microstructure, the system comprising:

a reservoir having a volume of photo-monomer adapted to polymerize by collimated light beams; and

a first patterning apparatus adapted to expose the volume of photo-monomer to a first three-dimensional light pattern;

a second patterning apparatus adapted to expose the volume of photo-monomer to a second three-dimensional light pattern,

wherein the first three-dimensional light pattern and the second three-dimensional light pattern are exposed on opposite exposure surfaces of the volume of photo-monomer, wherein the first three-dimensional light pattern creates a first three-dimensional interconnected pattern of polymer waveguides, wherein the second three-dimensional light pattern creates a second three-dimensional interconnected pattern of polymer waveguides, and wherein an exposure energy of each of the light patterns is sufficient to at least connect the first three-dimensional interconnected pattern of polymer waveguides to the second three-dimensional interconnected pattern of polymer waveguides.