Utilizing aperture with phase shift feature in forming microvias
First Claim
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1. A method, comprising:
- drilling a set of one or more microvias in a semiconductor package with an aperture;
wherein drilling the set of microvias comprises to use the aperture that has a base layer with an opening formed in the base layer, wherein the aperture further comprises an opaque layer formed on the base layer and a phase shift region formed in the opaque layer such that the phase shift region is adjacent to and surrounding the opening in the base layer.
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Abstract
A method, comprises drilling a set of one or more microvias in a semiconductor package with an aperture, wherein drilling the set of microvias comprises to use an aperture that has a phase shift region to reduce a spot size of a drilling beam that is used to form the set of microvias.
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Citations
12 Claims
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1. A method, comprising:
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drilling a set of one or more microvias in a semiconductor package with an aperture; wherein drilling the set of microvias comprises to use the aperture that has a base layer with an opening formed in the base layer, wherein the aperture further comprises an opaque layer formed on the base layer and a phase shift region formed in the opaque layer such that the phase shift region is adjacent to and surrounding the opening in the base layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification