Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
First Claim
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1. A method for processing a workpiece in a plasma reactor chamber, comprising:
- delivering RF power of respective frequencies through respective impedance match elements into the chamber;
generating in a controller a time-varying modulation control signal corresponding to a desired process transient cycle;
modulating the RF power of a first one of said respective frequencies in accordance with said time-varying modulation control signal;
reducing reflected power at an RF generator furnishing the RF power of any of said respective frequencies, said reducing comprises modulating the RF power of a second one of said respective frequencies in response to said time-varying modulation control signal; and
monitoring reflected RF power at an RF generator furnishing the RF power of one said respective frequencies, and controlling the degree of modulation of the RE power of said second one of said respective frequencies in response to said reflected RF power.
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Abstract
A method processing a workpiece in a plasma reactor chamber in which a first one of plural applied RF plasma powers is modulated in accordance with a time-varying modulation control signal corresponding to a desired process transient cycle. The method achieves a reduction in reflected power by modulating a second one of the plural plasma powers in response to the time-varying modulation control signal.
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Citations
18 Claims
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1. A method for processing a workpiece in a plasma reactor chamber, comprising:
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delivering RF power of respective frequencies through respective impedance match elements into the chamber; generating in a controller a time-varying modulation control signal corresponding to a desired process transient cycle; modulating the RF power of a first one of said respective frequencies in accordance with said time-varying modulation control signal; reducing reflected power at an RF generator furnishing the RF power of any of said respective frequencies, said reducing comprises modulating the RF power of a second one of said respective frequencies in response to said time-varying modulation control signal; and monitoring reflected RF power at an RF generator furnishing the RF power of one said respective frequencies, and controlling the degree of modulation of the RE power of said second one of said respective frequencies in response to said reflected RF power. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for processing a workpiece in a plasma reactor chamber, comprising:
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delivering RF power of respective frequencies through respective plural impedance matches into said reactor chamber; generating in a controller a time-varying modulation control signal corresponding to a desired process cycle transient; first modulating the RF power of a first one of said respective frequencies in accordance with said time-varying modulation control signal; reducing fluctuations in plasma impedance due to said first modulating by stability modulating the RF power of a second one of said respective frequencies in response to said time-varying modulation control signal. - View Dependent Claims (14, 15, 16, 17, 18)
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Specification