Megasonic precision cleaning of semiconductor process equipment components and parts
First Claim
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1. An apparatus for cleaning a processing component, comprising:
- a tank having a cavity defined by a base and one or more sidewalls extending therefrom, an opening opposite the base, and a closure coupled to the opening, the tank being configured to hold a volume of fluid within the cavity to immerse the processing component;
a plate assembly is coupled to a support structure that is located proximal to the opening of the tank and extends into the volume of fluid within the cavity, wherein the plate assembly is configured to move in a scanning motion along a horizontal plane located proximal to the opening and inside the closure of the tank, such that the plate assembly is movable over a surface of the processing component when present in the cavity of the tank, and wherein the plate assembly itself includes a transducer element and a resonator element, such that high frequency megasonic acoustic energy is generated by the plate assembly that is adjustable to a plurality of directions, certain ones of the plurality of directions of the plate assembly having orientation settings to a direction generally perpendicular to the surface of the processing component, for a surface location and surface configuration of the processing component;
a carrier element, wherein the carrier element is defined to support the processing component within the cavity of the tank, the carrier element having a mechanism for flipping the processing component during cleaning;
wherein the processing component is a semiconductor device processing component and is not a semiconductor wafer.
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Abstract
Methods and apparatus are provided for using various megasonic apparatus including megasonic tanks, scanning megasonic plates, megasonic jets, and megasonic sweeping beams etc., in combination with selective chemistries to remove sub-micron particulate contaminants from the surfaces of the processing equipment used in semiconductor, medical, or any other processing environments.
97 Citations
15 Claims
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1. An apparatus for cleaning a processing component, comprising:
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a tank having a cavity defined by a base and one or more sidewalls extending therefrom, an opening opposite the base, and a closure coupled to the opening, the tank being configured to hold a volume of fluid within the cavity to immerse the processing component; a plate assembly is coupled to a support structure that is located proximal to the opening of the tank and extends into the volume of fluid within the cavity, wherein the plate assembly is configured to move in a scanning motion along a horizontal plane located proximal to the opening and inside the closure of the tank, such that the plate assembly is movable over a surface of the processing component when present in the cavity of the tank, and wherein the plate assembly itself includes a transducer element and a resonator element, such that high frequency megasonic acoustic energy is generated by the plate assembly that is adjustable to a plurality of directions, certain ones of the plurality of directions of the plate assembly having orientation settings to a direction generally perpendicular to the surface of the processing component, for a surface location and surface configuration of the processing component; a carrier element, wherein the carrier element is defined to support the processing component within the cavity of the tank, the carrier element having a mechanism for flipping the processing component during cleaning; wherein the processing component is a semiconductor device processing component and is not a semiconductor wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An apparatus for cleaning a processing tool part used in the processing of semiconductor wafers, comprising:
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a tank having a cavity defined by a base and one or more sidewalls extending therefrom, an opening opposite the base, and a closure coupled to the opening, the tank being configured to hold a volume of fluid within the cavity to immerse the processing tool part; inside the cavity, the sidewalls including one or more megasonic transducers; a plate assembly is coupled to a support structure that is located proximal to the opening of the tank and extends into the cavity, wherein the plate assembly is movable along a horizontal plane located proximal to the opening and inside the closure of the tank, such that the plate assembly is movable over a surface of the processing tool part when present in the cavity of the tank, and wherein the plate assembly itself includes a transducer element and a resonator element, such that high frequency megasonic acoustic energy is generated by the plate assembly that is adjustable to a plurality of directions, certain ones of the plurality of directions of the plate assembly having orientation settings to a direction generally perpendicular to the surface of the processing component, for a surface location and surface configuration of the processing component; and a carrier element, wherein the carrier element supports the processing tool part within the cavity of the tank, the carrier element having a mechanism for flipping the processing component during cleaning, the processing tool part not being a semiconductor wafer.
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15. An apparatus for cleaning a processing tool part used in the processing of semiconductor wafers, comprising:
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a tank having a cavity defined by a base and one or more sidewalls extending therefrom, an opening opposite the base, and a closure coupled to the opening, the tank being configured to hold a volume of fluid within the cavity to immerse the processing tool part; inside the cavity, the sidewalls including one or more megasonic transducers; a top plate assembly is coupled to a support structure that is located proximal to the opening of the tank and extends into the cavity, wherein the top plate assembly is movable along a horizontal plane located proximal to the opening and inside the closure of the tank, such that the top plate assembly is movable over a surface of the processing tool part when present in the cavity of the tank, and wherein the top plate assembly itself includes a transducer element and a resonator element, such that high frequency megasonic acoustic energy is generated by the top plate assembly that is adjustable to a plurality of directions, certain ones of the plurality of directions of the plate assembly having orientation settings to a direction generally perpendicular to the surface of the processing tool part, for a surface location and surface configuration of the processing tool part; a bottom plate assembly coupled to the base of the tank, the bottom plate assembly is movable along a horizontal plane located proximal to the base of the tank, such that the bottom plate assembly is movable under a surface of the processing tool part when present in the cavity of the tank, wherein the bottom plate assembly itself includes a transducer element and a resonator element, such that high frequency megasonic acoustic energy is generated by the bottom plate assembly and is associated with a direction generally perpendicular to the surface of the processing tool part; and a carrier element, wherein the carrier element provides support for the processing tool part within the cavity of the tank, the carrier element having a mechanism for flipping the processing tool part during cleaning, and the processing tool part is not a semiconductor wafer.
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Specification