Methods for producing omni-directional multi-layer photonic structures
First Claim
1. A method for producing a multi-layer photonic structure comprising at least one group of alternating layers of high index material and low index material, the method comprising:
- determining a characteristic property function for the multi-layer photonic structure;
determining a thickness multiplier for the at least one group of alternating layers by fitting the characteristic property function to a target profile;
adjusting the characteristic property function with the determined thickness multiplier; and
comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
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Accused Products
Abstract
A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
104 Citations
20 Claims
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1. A method for producing a multi-layer photonic structure comprising at least one group of alternating layers of high index material and low index material, the method comprising:
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determining a characteristic property function for the multi-layer photonic structure; determining a thickness multiplier for the at least one group of alternating layers by fitting the characteristic property function to a target profile; adjusting the characteristic property function with the determined thickness multiplier; and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for producing an omni-directionally reflective multi-layer photonic structure comprising at least one group of alternating layers of high index material and low index material, the method comprising:
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determining reflectance functions for the multi-layer photonic structure for multiple angles of light incident on the multi-layer photonic structure; determining a value for a thickness multiplier for each group of alternating layers by fitting the reflectance function for each angle of light to a target reflectance profile; adjusting the reflectance function for each angle of light based on the determined thickness multipliers; and comparing the adjusted reflectance function for each angle of light to the target reflectance profile, wherein, when the adjusted reflectance functions do not approximate the target reflectance profile, at least one additional group of layers is added to the multi-layer photonic structure. - View Dependent Claims (8, 9, 10, 11, 12)
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13. A method for producing an omni-directional UV-IR reflector comprising at least one group of alternating layers of high and low index material, the method comprising:
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determining reflectance functions for multiple angles of light incident on the multi-layer photonic structure; selecting a target reflectance profile having about 100% reflectance for wavelengths of light in the UV range of the electromagnetic spectrum, less than 100% reflectance for wavelengths of light in the visible range of the electromagnetic spectrum, and about 100% reflectance for wavelengths of light in the IR range of the electromagnetic spectrum; determining a value for the at least one thickness multiplier by fitting the reflectance function for each angle of light to a target reflectance profile; and adjusting the reflectance function for each angle of light based on the determined thickness multipliers; and comparing the adjusted reflectance function for each angle of light to the target reflectance profile, wherein, when the adjusted reflectance functions do not approximate the target reflectance profile, at least one additional group of layers is added to the multi-layer photonic structure. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification