Localized annealing during semiconductor device fabrication
First Claim
Patent Images
1. A process for reducing cross-contamination of wafers during fabrication of semiconductor devices on a substrate and at least one metal layer, the process comprising:
- removing the substrate and applying a second substrate to the semiconductor devices; and
annealing the at least one metal layer by application of a beam of electromagnetic radiation directly on the at least one metal layer, wherein a mask is placed between a source of the beam of electromagnetic radiation and the semiconductor devices, the mask having at least one aperture therethrough for the passage of the beam of electromagnetic radiation through the at least one aperture during the annealing, the at least one aperture being sized and shaped to be substantially the same as the at least one metal layer being annealed.
1 Assignment
0 Petitions
Accused Products
Abstract
A process for the fabrication of semiconductor devices on a substrate, the semiconductor devices including at least one metal layer. The process includes, removing the substrate and applying a second substrate; and annealing the at least one metal layer by application of a beam of electromagnetic radiation on the at least one metal layer.
-
Citations
9 Claims
-
1. A process for reducing cross-contamination of wafers during fabrication of semiconductor devices on a substrate and at least one metal layer, the process comprising:
-
removing the substrate and applying a second substrate to the semiconductor devices; and annealing the at least one metal layer by application of a beam of electromagnetic radiation directly on the at least one metal layer, wherein a mask is placed between a source of the beam of electromagnetic radiation and the semiconductor devices, the mask having at least one aperture therethrough for the passage of the beam of electromagnetic radiation through the at least one aperture during the annealing, the at least one aperture being sized and shaped to be substantially the same as the at least one metal layer being annealed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
Specification