Exposure apparatus and device manufacturing method

• US 8,330,934 B2
• Filed: 02/24/2010
• Issued: 12/11/2012
• Est. Priority Date: 01/26/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation, Tokyo Electron Limited
• Original Assignee: Nikon Corporation, Tokyo Electron Limited
• Inventors: Nagasaka, Hiroyuki, Yamamoto, Taro, Hirakawa, Osamu
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/659,066
• Publication Number:
  US 20100157262A1
• Time in Patent Office: 1,021 Days
• Field of Search: 355/30, 355/53, 355/72
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.

Claims

1. An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid so as to expose the substrate, the apparatus comprising:

a supply pipe which supplies the liquid;

a temperature regulation apparatus which is connected to the supply pipe and performs temperature regulation of the liquid supplied to the supply pipe, wherein the temperature regulation apparatus has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of the temperature of the liquid; and

a degassing apparatus which is arranged between the rough temperature regulator and the fine temperature regulator and reduces a gas dissolution concentration in the liquid.

2. An exposure apparatus according to claim 1, further comprising:

a filter which is arranged between the rough temperature regulator and the fine temperature regulator and removes foreign matter in the liquid.

3. An exposure apparatus according to claim 1, further comprising:

a chamber which accommodates the projection optical system and the supply pipe and whose interior is air-conditioned; and

a temperature measuring apparatus which measures a temperature within the chamber,

wherein temperature regulation of the liquid is performed by the temperature regulation apparatus based on a measurement result of the temperature measuring apparatus.

4. An exposure apparatus according to claim 3, wherein the temperature regulation apparatus is arranged outside the chamber.

5. An exposure apparatus described in claim 3, further comprising:

a liquid temperature measuring apparatus which measures a temperature of one of the liquid inside the supply pipe and the liquid supplied from the supply pipe,

wherein temperature regulation of the liquid is controlled by the temperature regulation apparatus based on a measurement result of the liquid temperature measuring apparatus.

6. An exposure apparatus described in claim 1, further comprising:

a liquid temperature measuring apparatus which measures a temperature of one of the liquid inside the supply pipe and the liquid supplied from the supply pipe,

wherein temperature regulation of the liquid is controlled by the temperature regulation apparatus based on a measurement result of the liquid temperature measuring apparatus.

7. A device manufacturing method using an exposure apparatus according to claim 1.