Exposure apparatus and measuring device for a projection lens
First Claim
1. An optical system, comprising:
- an illumination system configured to generate projection light;
a projection lens configured to image a mask onto a photosensitive layer, an immersion space being between the projection lens and the photosensitive layer;
an immersion liquid in the immersion space, the immersion liquid being in direct contact with the projection lens and the photosensitive layer to define an interface between the immersion liquid and a surrounding gas, the interface extending between the projection lens and the photosensitive layer;
a heat transfer element configured so that, during an immersion operation, the heat transfer element transfers an amount of heat to or from the immersion liquid;
a) at the interface between the immersion liquid and a surrounding gas;
or b) within the immersion liquid; and
a control device configured to adjust the amount of heat transferred by the heat transfer element to or from the immersion liquid,wherein the optical system is a microlithographic projection exposure apparatus.
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Accused Products
Abstract
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
129 Citations
24 Claims
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1. An optical system, comprising:
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an illumination system configured to generate projection light; a projection lens configured to image a mask onto a photosensitive layer, an immersion space being between the projection lens and the photosensitive layer; an immersion liquid in the immersion space, the immersion liquid being in direct contact with the projection lens and the photosensitive layer to define an interface between the immersion liquid and a surrounding gas, the interface extending between the projection lens and the photosensitive layer; a heat transfer element configured so that, during an immersion operation, the heat transfer element transfers an amount of heat to or from the immersion liquid;
a) at the interface between the immersion liquid and a surrounding gas;
or b) within the immersion liquid; anda control device configured to adjust the amount of heat transferred by the heat transfer element to or from the immersion liquid, wherein the optical system is a microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An optical system, comprising:
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an illumination system configured to generate projection light; a projection lens configured to image a mask onto a photosensitive layer, an immersion space being between the projection lens and the photosensitive layer; an immersion liquid in the immersion space, the immersion liquid being in direct contact with the projection lens and the photosensitive layer to define an interface between the immersion liquid and a surrounding gas; a heat transfer element disposed a distance from the interface so that, during an immersion operation, the heat transfer element exchanges an amount of heat with the immersion liquid via thermal radiation; and a control device configured to adjust the amount of heat transferred by the heat transfer element to or from the immersion liquid, wherein the optical system is a microlithographic projection exposure apparatus. - View Dependent Claims (20, 21, 22, 23, 24)
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Specification