Sputtering composite target, method for manufacuturing transparent conductive film using the same and transparent conductive film-provided base material
First Claim
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1. A sputtering composite target comprising:
- an oxide-based component containing indium oxide and having a target surface area; and
a carbon-based component laminated on at least a portion of the target surface area of the oxide-based component such that an area ratio occupied by the carbon-based component is from 2 to 15% relative to 100% of the target surface area;
wherein the carbon-based component comprises at least one of a carbon powder, a carbon chip and a carbide material including at least one of Al4C3, NbC, TaC and ZrC.
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Abstract
A sputtering composite target includes: an oxide based component containing indium oxide; and a carbon based component.
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Citations
12 Claims
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1. A sputtering composite target comprising:
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an oxide-based component containing indium oxide and having a target surface area; and a carbon-based component laminated on at least a portion of the target surface area of the oxide-based component such that an area ratio occupied by the carbon-based component is from 2 to 15% relative to 100% of the target surface area; wherein the carbon-based component comprises at least one of a carbon powder, a carbon chip and a carbide material including at least one of Al4C3, NbC, TaC and ZrC. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for manufacturing a transparent conductive film comprising the act of:
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forming a transparent conductive film on a substrate using a sputtering composite target comprising an oxide-based component containing indium oxide having a target surface area and a carbon-based component laminated on at least a portion of the target surface area of the oxide-based component such that an area ratio occupied by the carbon-based component is from 2 to 15% relative to 100% of the target surface area; wherein forming a transparent conductive film on a substrate comprises introducing a sputtering gas into a chamber at a gas flow rate of from 5 to 50 sccm. - View Dependent Claims (8, 9, 10, 11)
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12. A sputtering composite target comprising:
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an oxide-based component containing indium oxide and having a target surface area; a carbon-based component laminated on at least a portion of the target surface area of the oxide-based component such that an area ratio occupied by the carbon-based component is from 2 to 15% relative to 100% of the target surface area; wherein the carbon-based component comprises at least one of a carbon powder, a carbon chip and a carbide materials including at least one of Al4C3, NbC, TaC and ZrC; wherein the oxide-based component comprises a disc shape; and wherein the carbon-based component comprises at least one sector shape disposed on a surface of the disc shaped oxide-based component and having a prescribed angle.
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Specification