Method of measuring shot shape and mask
First Claim
1. A method of measuring shot shape comprising:
- sequentially exposing a substrate with main scale marks in compliance with a predetermined map, and forming a reference grid including a plurality of the main scale marks arranged in the predetermined map in at least one shot region;
exposing a shot for measuring, via a projection optical system, that includes a plurality of auxiliary scale marks arranged in the predetermined map in the shot region;
measuring a relative positional relationship between adjacent main scale marks in the shot region exposed on the substrate;
measuring an amount of deviation between the main scale marks and the auxiliary scale marks; and
correcting the reference grid based on the measured relative positional relationship so that the corrected reference grid does not include positioning error of the substrate caused in the process of forming the reference grid, and calculating a shot shape of the shot for measuring based on the corrected reference grid and the amount of deviation.
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Accused Products
Abstract
A method of measuring shot shape includes sequentially exposing a substrate with main scale marks (32) in compliance with a predetermined map, and forming a reference grid including a plurality of the main scale marks (32) arranged in the predetermined map in at least one shot region, exposing a shot for measuring, via a projection optical system, that includes a plurality of auxiliary scale marks (34) arranged in the predetermined map in the shot region, measuring a relative positional relationship between adjacent main scale marks (32), measuring an amount of deviation between the main scale marks (32) and the auxiliary scale marks (34), and correcting the reference grid based on the relative positional relationship, and calculating a shot shape of the shot for measuring based on the corrected reference grid and the amount of deviation.
26 Citations
8 Claims
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1. A method of measuring shot shape comprising:
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sequentially exposing a substrate with main scale marks in compliance with a predetermined map, and forming a reference grid including a plurality of the main scale marks arranged in the predetermined map in at least one shot region; exposing a shot for measuring, via a projection optical system, that includes a plurality of auxiliary scale marks arranged in the predetermined map in the shot region; measuring a relative positional relationship between adjacent main scale marks in the shot region exposed on the substrate; measuring an amount of deviation between the main scale marks and the auxiliary scale marks; and correcting the reference grid based on the measured relative positional relationship so that the corrected reference grid does not include positioning error of the substrate caused in the process of forming the reference grid, and calculating a shot shape of the shot for measuring based on the corrected reference grid and the amount of deviation. - View Dependent Claims (2, 3, 4, 5)
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6. A mask comprising:
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at least one main scale mark; auxiliary scale marks that are arranged in a grid formation along a first direction and a second direction orthogonal to the first direction, each of the auxiliary scale marks and the main scale mark are superimposed to indicate a relative amount of deviation between them; and at least one pair of surrounding marks arranged such as to sandwich the main scale mark, the pair of surrounding marks including a main surrounding mark, and an auxiliary surrounding mark that is separated by a grid interval of the auxiliary scale mark from the main surrounding mark, and the auxiliary surrounding mark and the main surrounding mark are superimposed to indicate a relative amount of deviation between the main surrounding mark and the auxiliary surrounding mark, wherein the main surrounding mark and the auxiliary surrounding mark are located at a same distance from the main scale mark, the distance is half of the grid interval of the auxiliary scale mark. - View Dependent Claims (7, 8)
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Specification