Spin-on anti-reflective coatings for photolithography
First Claim
1. A method of making a spin-on composition comprising:
- combining at least one silane reactant, at least one incorporatable organic absorbing compound, an acid/water mixture, and one or more solvents to form a reaction mixture;
heating the reaction mixture to form the spin-on composition; and
adding at least one of the following to the spin-on composition;
an γ
-aminoalkyltrialkoxysilane, an oxide, an alkoxide, a hydrogen halide, propylene glycol methyl ether acetate, tetramethylammonium hydroxide, an amine-based oligomer and combinations thereof.
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Accused Products
Abstract
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
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Citations
8 Claims
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1. A method of making a spin-on composition comprising:
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combining at least one silane reactant, at least one incorporatable organic absorbing compound, an acid/water mixture, and one or more solvents to form a reaction mixture; heating the reaction mixture to form the spin-on composition; and adding at least one of the following to the spin-on composition;
an γ
-aminoalkyltrialkoxysilane, an oxide, an alkoxide, a hydrogen halide, propylene glycol methyl ether acetate, tetramethylammonium hydroxide, an amine-based oligomer and combinations thereof. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method of making a coating solution containing a spin-on material comprising:
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combining at least one alkoxysilane or halosilane;
at least one incorporatable organic absorbing compounds;
an acid/water mixture, and one or more solvents to form a reaction mixture;heating the reaction mixture to form the spin-on material; and adding at least one of the following to the spin-on composition;
an γ
-aminoalkyltrialkoxysilane, an oxide, an alkoxide, a hydrogen halide, propylene glycol methyl ether acetate, tetramethylammonium hydroxide, an amine-based oligomer and combinations thereof. - View Dependent Claims (8)
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Specification