Device to reduce shadowing during radiative heating of a substrate
First Claim
1. A substrate heating apparatus, comprising:
- a radiative heat source coupled to a processing system and configured to produce electromagnetic (EM) radiation for heating a substrate disposed in said processing system;
a translucent object disposed between said radiative heat source and said substrate along an EM wave path there between; and
an opaque object disposed between said radiative heat source and said substrate along said EM wave path there between, wherein;
said translucent object comprises at least one textured surface to cause random refraction of said EM radiation passing through said translucent object, orsaid translucent object comprises an optical waveguide configured to encapsulate said opaque object and direct said EM radiation around said opaque object, ora combination thereof.
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Accused Products
Abstract
A substrate heating apparatus configured to be coupled to a processing system and radiatively heat a substrate is described. The substrate heating apparatus includes a radiative heat source coupled to a processing system and configured to produce electromagnetic (EM) radiation, a translucent object positioned between the radiative heat source and the substrate along a the EM radiation path, and an opaque object also positioned between the radiative heat source and the substrate along the EM radiation path. The translucent object includes at least one textured surface to cause random refraction of the EM radiation passing through the translucent object, or an optical waveguide configured to encapsulate the opaque object and direct the EM radiation around the opaque object, or both, to prevent creation of a shadow of the opaque object on the substrate.
4 Citations
20 Claims
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1. A substrate heating apparatus, comprising:
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a radiative heat source coupled to a processing system and configured to produce electromagnetic (EM) radiation for heating a substrate disposed in said processing system; a translucent object disposed between said radiative heat source and said substrate along an EM wave path there between; and an opaque object disposed between said radiative heat source and said substrate along said EM wave path there between, wherein; said translucent object comprises at least one textured surface to cause random refraction of said EM radiation passing through said translucent object, or said translucent object comprises an optical waveguide configured to encapsulate said opaque object and direct said EM radiation around said opaque object, or a combination thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A processing system, comprising:
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a process chamber; a susceptor coupled to said process chamber and configured to support a substrate; a substrate heating apparatus coupled to said processing system and configured to radiatively heat said substrate, comprising; a radiative heat source configured to produce electromagnetic (EM) radiation; a translucent object disposed between said radiative heat source and said substrate along an EM wave path there between; and an opaque object disposed between said radiative heat source and said substrate along said EM wave path there between, wherein; said translucent object comprises at least one textured surface to cause random refraction of said EM radiation passing through said translucent object, or said translucent object comprises an optical waveguide configured to encapsulate said opaque object and direct said EM radiation around said opaque object, or a combination thereof; and a gas distribution system configured to introduce a process gas to said process chamber to facilitate film forming reactions at a surface of said substrate. - View Dependent Claims (20)
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Specification