×

Lithographic apparatus and device manufacturing method

  • US 8,344,341 B2
  • Filed: 08/09/2010
  • Issued: 01/01/2013
  • Est. Priority Date: 11/12/2002
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method of patterning a substrate, the method comprising:

  • measuring a substrate using a first table, wherein the measuring is not performed through liquid adjacent to the first table;

    moving a substrate on a second, separate table into an optical path of a projection system;

    providing a liquid in a space between the projection system and the substrate; and

    projecting a patterned beam through the liquid onto a target portion of the substrate.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×