Lithographic apparatus and device manufacturing method
First Claim
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1. A method of patterning a substrate, the method comprising:
- measuring a substrate using a first table, wherein the measuring is not performed through liquid adjacent to the first table;
moving a substrate on a second, separate table into an optical path of a projection system;
providing a liquid in a space between the projection system and the substrate; and
projecting a patterned beam through the liquid onto a target portion of the substrate.
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Abstract
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
64 Citations
9 Claims
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1. A method of patterning a substrate, the method comprising:
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measuring a substrate using a first table, wherein the measuring is not performed through liquid adjacent to the first table; moving a substrate on a second, separate table into an optical path of a projection system; providing a liquid in a space between the projection system and the substrate; and projecting a patterned beam through the liquid onto a target portion of the substrate. - View Dependent Claims (2, 3, 4, 5)
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6. A method of patterning a substrate, the method comprising:
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measuring a substrate with a beam of radiation, wherein the measuring beam is not transmitted through liquid adjacent to the substrate; and projecting a patterned beam through the liquid to expose a target portion of radiation sensitive material of the measured substrate. - View Dependent Claims (7, 8, 9)
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Specification